Volume 31 Issue 4
Apr.  2019
Turn off MathJax
Article Contents
You Libing, Cheng Chao, Fang Xiaodong. Application of all-solid-state high-voltage pulse power supply in semiconductor lithography light source[J]. High Power Laser and Particle Beams, 2019, 31: 040019. doi: 10.11884/HPLPB201931.190001
Citation: You Libing, Cheng Chao, Fang Xiaodong. Application of all-solid-state high-voltage pulse power supply in semiconductor lithography light source[J]. High Power Laser and Particle Beams, 2019, 31: 040019. doi: 10.11884/HPLPB201931.190001

Application of all-solid-state high-voltage pulse power supply in semiconductor lithography light source

doi: 10.11884/HPLPB201931.190001
  • Received Date: 2019-01-01
  • Rev Recd Date: 2019-02-20
  • Publish Date: 2019-04-15
  • The basic principle and application of high-voltage pulse power supply are briefly described, the principle and characteristics of all-solid-state high-voltage pulse power supply are introduced. The history of semiconductor lithography and the need for excimer lasers as light sources in semiconductor lithography are reviewed. The application of all-solid-state high-voltage pulse power supply in excimer laser for lithography is emphasized. The high-power semiconductor switch combined with multi-stage magnetic pulse compression switch is used to replace the traditional thyristor-based high-voltage pulse power supply, and a long life operation of the excimer laser at a high repetition rate is achieved. The progress of the research on the all-solid-state high-voltage pulse power supply of excimer lasers in the past ten years of Anhui Institute of Optics and Fine Mechanics of Chinese Academy of Sciences is also introduced. Finally, the future demand for all-solid-state pulsed power sources for semiconductor lithography sources is expected.
  • loading
  • [1]
    蒋文波, 胡松. 传统光学光刻的极限及下一代光刻技术[J]. 微纳电子技术, 2008(6): 361-365, 369. doi: 10.3969/j.issn.1671-4776.2008.06.011

    Jiang Wenbo, Hu Song. The limits of traditional optical lithography and next generation lithography. Micronanoelectronic Technology, 2008(6): 361-365, 369 doi: 10.3969/j.issn.1671-4776.2008.06.011
    [2]
    Hazelton A J, Wakamoto S, Hirukawa S, et al. Double-patterning requirements for optical lithography and prospects for optical extension without double patterning[J]. Journal of Micro/ Nanolithography Mems & Moems, 2009, 8(8): 365-372.
    [3]
    Miao X, Xu X, Bencher C, et al. Double patterning combined with shrink technique to extend ArF lithography for contact holes to 22 nm node and beyond[C]//Proc of SPIE. 2008: 69240A.
    [4]
    Piscani E C, Byers J, Zimmerman P, et al. Continuing 193 nm optical lithography for 32 nm imaging and beyond[C]//Proc of SPIE. 2008: 69242I.
    [5]
    饶俊峰. 基于固态开关的重复频率脉冲功率源的脉冲调制技术及其应用[D]. 上海: 复旦大学, 2013.

    Rao Junfeng. Pulse modulation technology of repetitive frequency pulse power source based on solid state switch and its application. Shanghai: Fudan University, 2013
    [6]
    游利兵, 梁勖, 余吟山. 固体开关小能量准分子激光器的设计与实验研究[J]. 中国激光, 2010, 37(2): 370-373. https://www.cnki.com.cn/Article/CJFDTOTAL-JJZZ201002015.htm

    You Libing, Liang Xu, Yu Yinshan, et al. Design and experimental study of an excimer laser based on solid state pulsed power module. Chinese Journal of Lasers, 2010, 37(2): 370-373 https://www.cnki.com.cn/Article/CJFDTOTAL-JJZZ201002015.htm
    [7]
    方旭, 丁臻捷, 浩庆松, 等. 磁开关磁芯动态参数测试及分析[J]. 强激光与粒子束, 2017, 29: 105001. doi: 10.11884/HPLPB201729.170166

    Fang Xu, Ding Zhenjie, Hao Qingsong, et al. Dynamic parameter test and analysis of magnetic switch core. High Power Laser and Particle Beams, 2017, 29: 105001 doi: 10.11884/HPLPB201729.170166
    [8]
    游利兵, 周翊, 梁勖, 等. 近期光刻用ArF准分子激光技术发展[J]. 量子电子学报, 2010, 27(5): 522-527. doi: 10.3969/J.issn.1007-5461.2010.05.002

    You Libing, Zhou Xiang, Liang Xu, et al. Recent development of lithography using ArF excimer laser technology. Chinese Journal of Quantum Electronics, 2010, 27(5): 522-527 doi: 10.3969/J.issn.1007-5461.2010.05.002
    [9]
    占平平, 刘卫国. EUV光刻技术进展[J]. 科技信息, 2011(21): 44, 418. https://www.cnki.com.cn/Article/CJFDTOTAL-KJXX201121031.htm

    Zhan Pingping, Liu Weiguo. Progress in EUV lithography. Science & Technology Information, 2011(21): 44, 418 https://www.cnki.com.cn/Article/CJFDTOTAL-KJXX201121031.htm
    [10]
    余吟山, 游利兵, 梁勖, 等. 准分子激光技术发展[J]. 中国激光, 2010, 37(9): 2253-2270. https://www.cnki.com.cn/Article/CJFDTOTAL-JJZZ201009014.htm

    Yu Yinshan, You Libing, Liang Xu, et al. Excimer laser technology development. Chinese Journal of Lasers, 2010, 37(9): 2253-2270 https://www.cnki.com.cn/Article/CJFDTOTAL-JJZZ201009014.htm
    [11]
    Basting D, Pippert K D, Stamm U. History and future prospects of excimer lasers[C]//Proc of SPIE. 2002, 4426: 25-34.
    [12]
    Barrett D M. Parameters which influence the performance of practical magnetic switches[C]//IEEE International Pulsed Power Conference. 1995, 2: 1154-1159.
    [13]
    Ness R, Metcher P, Ferguson G, et al. A decade of solid state pulsed power development at Cymer Inc[C]//Conference Record of the Twenty-Sixth International Power Modulator Symposium, 2004 and 2004 High-Voltage Workshop. 2005.
    [14]
    Stamm U. Extreme ultraviolet light sources for use in semiconductor lithography-state of the art and future development[J]. Journal of Physics D: Applied Physics, 2004, 37(23): 3244. doi: 10.1088/0022-3727/37/23/005
    [15]
    Hermans J V, Laidler D, Foubert P, et al. Progress in EUV lithography towards manufacturing from an exposure tool perspective[C]//Proc of SPIE. 2012: 832202.
    [16]
    Fomenkov I, Brandt D, Ershov A, et al. Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling[J]. Advanced Optical Technologies, 2017, 6(3/4): 173-186.
    [17]
    Yusuke T, Zenzo N, Daiki Y, et al. Development of Sn-fueled high-power DPP EUV source for enabling HVM[C]//Proc of SPIE. 2007: 65173R.
    [18]
    赵永蓬, 徐强, 李琦, 等. 13.5 nm放电Xe等离子体极紫外光源[J]. 中国激光, 2018, 45: 1100001. https://www.cnki.com.cn/Article/CJFDTOTAL-JJZZ201811001.htm

    Zhao Yongpeng, Xu Qiang, Li Qi, et al. 13.5 nm extreme ultraviolet light source based on discharge produced Xe plasma. Chinese Journal of Lasers, 2018, 45: 1100001 https://www.cnki.com.cn/Article/CJFDTOTAL-JJZZ201811001.htm
    [19]
    游利兵, 梁勖, 余吟山. 准分子激光全固态脉冲电源设计与实验研究[J]. 强激光与粒子束, 2009, 21(11): 1750-1754. http://www.hplpb.com.cn/article/id/4253

    You Libing, Liang Xu, Yu Yinshan. Design and experimental study of all solid state pulse power module for excimer lasers. High Power Laser and Particle Beams, 2009, 21(11): 1750-1754 http://www.hplpb.com.cn/article/id/4253
    [20]
    王庆胜, 游利兵, 余吟山, 等. kHz准分子激光器全固态脉冲激励源[J]. 强激光与粒子束, 2013, 25(4): 885-889. http://www.hplpb.com.cn/article/id/7385

    Wang Qingsheng, You Libing, Yu Yinshan, et al. kHz excimer laser all solid state pulse excitation source. High Power Laser and Particle Beams, 2013, 25(4): 885-889 http://www.hplpb.com.cn/article/id/7385
  • 加载中

Catalog

    通讯作者: 陈斌, bchen63@163.com
    • 1. 

      沈阳化工大学材料科学与工程学院 沈阳 110142

    1. 本站搜索
    2. 百度学术搜索
    3. 万方数据库搜索
    4. CNKI搜索

    Figures(17)  / Tables(2)

    Article views (1735) PDF downloads(248) Cited by()
    Proportional views
    Related

    /

    DownLoad:  Full-Size Img  PowerPoint
    Return
    Return