Application of fast pulsed power supply to high energy photon source

Chen Jinhui; Wang Lei; Shi Hua; Huo Lihua; Wang Guanwen; Liu Peng; Shi Xiaolei

doi:10.11884/HPLPB201931.190007

Volume 31 Issue 4

Apr. 2019

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Article Navigation > High Power Laser and Particle Beams > 2019 > 31(4): 040017

Chen Jinhui, Wang Lei, Shi Hua, et al. Application of fast pulsed power supply to high energy photon source[J]. High Power Laser and Particle Beams, 2019, 31: 040017. doi: 10.11884/HPLPB201931.190007

Citation:

Chen Jinhui, Wang Lei, Shi Hua, et al. Application of fast pulsed power supply to high energy photon source[J]. High Power Laser and Particle Beams, 2019, 31: 040017. doi: 10.11884/HPLPB201931.190007

Chen Jinhui, Wang Lei, Shi Hua, et al. Application of fast pulsed power supply to high energy photon source[J]. High Power Laser and Particle Beams, 2019, 31: 040017. doi: 10.11884/HPLPB201931.190007

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Application of fast pulsed power supply to high energy photon source

doi: 10.11884/HPLPB201931.190007

Chen Jinhui^{1, 2
,},
Wang Lei²,
Shi Hua²,
Huo Lihua²,
Wang Guanwen²,
Liu Peng^{1, 2},
Shi Xiaolei¹

1.
School of Nuclear Science and Technology, University of Chinese Academy of Sciences, Beijing 100049, China
2.
Accelerator Division, Institute of High Energy Physics, Chinese Academy of Sciences, Beijing 100049, China

Received Date: 2019-01-09
Rev Recd Date: 2019-03-14
Publish Date: 2019-04-15

Abstract

Abstract

High Energy Photon Source (HEPS) is the next generation of high-brightness photon source based on storage ring planned in China. Its natural emittance of the beam is close to the diffraction limit. As a typical low emittance storage ring (LER), the dynamic aperture of HEPS is far smaller than the physical aperture. Hence the traditional off-axis cumulative injection can not meet the requirements, and only strip-line kicker based on in-line injection scheme can be used. In order to realize bunch-by-bunch control, HEPS requires injecting kicker electrical pulse with a bottom width (3%-3%) of less than 10 ns, a half width (50%-50%) of more than 4.5 ns, an amplitude of >+17.5 kV (50 Ω load) and a repetition frequency of more than 50 Hz. A prototype of bipolar fast pulsed power supply based on DSRD has been developed on the project of HEPS-TF. The performance of the prototype can produce a pulse at 50 Ω load with rise time (10%-90%) < 2.6 ns, fall time (90%-10%) < 3.2 ns, FWHM (50%-50%) > 5 ns, bottom width (3%-3%) < 10 ns, amplitude >18 kV. It can meet the requirement of on-axis swap-out injection which is the baseline injection scheme of HEPS.
- HEPS,
- DLSR,
- injection and extraction,
- on-axis injection,
- strip-line kicker,
- fast pulser,
- DSRD

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References(24)

References

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