yin wei, xu shi-zhen, zu xiao-tao, et al. Growth of laser initiated damage in fused silica at 355 nm[J]. High Power Laser and Particle Beams, 2008, 20.
Citation:
yin wei, xu shi-zhen, zu xiao-tao, et al. Growth of laser initiated damage in fused silica at 355 nm[J]. High Power Laser and Particle Beams, 2008, 20.
yin wei, xu shi-zhen, zu xiao-tao, et al. Growth of laser initiated damage in fused silica at 355 nm[J]. High Power Laser and Particle Beams, 2008, 20.
Citation:
yin wei, xu shi-zhen, zu xiao-tao, et al. Growth of laser initiated damage in fused silica at 355 nm[J]. High Power Laser and Particle Beams, 2008, 20.
The damaged sites located on input and exit surface have been irradiated respectively with 355 nm pulse laser. After each shot, photograph of growth of the damaged site has been taken and the area of the damaged site has been measured. Experimental results show exponential growth in the lateral size of damage sites located on exit surface with shot number, whereas linear growth in the lateral site of damage sites located on input surface.
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