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放电功率变化对电磁波在电感耦合闭式等离子体中的衰减特性

林茂 徐浩军 魏小龙 韩欣珉 常怡鹏 林敏

林茂, 徐浩军, 魏小龙, 等. 放电功率变化对电磁波在电感耦合闭式等离子体中的衰减特性[J]. 强激光与粒子束. doi: 10.11884/HPLPB202133.200320
引用本文: 林茂, 徐浩军, 魏小龙, 等. 放电功率变化对电磁波在电感耦合闭式等离子体中的衰减特性[J]. 强激光与粒子束. doi: 10.11884/HPLPB202133.200320
Lin Mao, Xu Haojun, Wei Xiaolong, et al. Attenuation characteristics of electromagnetic wave in inductive coupled plasma based on variation of discharge power[J]. High Power Laser and Particle Beams. doi: 10.11884/HPLPB202133.200320
Citation: Lin Mao, Xu Haojun, Wei Xiaolong, et al. Attenuation characteristics of electromagnetic wave in inductive coupled plasma based on variation of discharge power[J]. High Power Laser and Particle Beams. doi: 10.11884/HPLPB202133.200320

放电功率变化对电磁波在电感耦合闭式等离子体中的衰减特性

doi: 10.11884/HPLPB202133.200320
基金项目: 国家自然科学基金资项目(12075319)
详细信息
    作者简介:

    林茂:林 茂(1988—),男,博士,主要从事低气压等离子放电技术研究;496180444@qq.com

  • 中图分类号: TM31

Attenuation characteristics of electromagnetic wave in inductive coupled plasma based on variation of discharge power

  • 摘要: 射频电感耦合等离子体(ICP)放电方式能够在较宽的压强范围内产生大面积、密度高的等离子体,在对电磁波衰减应用中具有较大优势。通过研究ICP等离子体与电磁波相互作用的过程,改进闭式等离子体模型,建立电磁波在非均匀等离子体中传播的分层计算模型,对实测诊断分布情形下等离子体与电磁波的相互作用进行研究,得到不同功率条件下电磁波衰减的变化情况;提出射频电感耦合闭式等离子体用于电磁波衰减的方法并实验验证,基于等离子体覆盖金属平板的测量模型,在实验室内搭建了以金属板为衬底的弓形微波反射测试系统,研究了闭式等离子体对4~8 GHz频段范围内微波反射的作用特性,以及不同射频功率对微波反射的影响规律,并将实验测量与计算结果进行对比分析。实验表明,通过功率调节,电感耦合闭式等离子体对5.92~6.8 GHz频带电磁波具有明显的衰减作用。
  • 图  1  闭式等离子体分层计算模型示意图

    Figure  1.  Schematic diagram of a closed plasma hierarchical calculation model

    图  2  平板型ICP发生装置的放电腔室与天线示意图和实物图

    Figure  2.  Schematic diagram and picture of discharge chamber and antenna of flat plate ICP generator

    图  3  闭式等离子体电子密度测量值与拟合结果

    Figure  3.  Electron density measurement and fitting results of closed plasma

    图  4  电子密度为实测值的衰减情况

    Figure  4.  Attenuation of measured electron density values

    图  5  实验装置实物图

    Figure  5.  Experimental setup and device

    图  6  功率为200 W时ICP等离子体对电磁波的衰减变化

    Figure  6.  Attenuation of microwave in ICP when the power is 200 W

    图  7  功率为300 W时ICP等离子体对电磁波的衰减变化

    Figure  7.  Attenuation of microwave in ICP when the power is 300 W

    图  8  功率为400 W时ICP等离子体对电磁波的衰减变化

    Figure  8.  Attenuation of microwave in ICP plasma when the power is 400 W

    图  9  功率为500 W时ICP等离子体对电磁波的衰减变化

    Figure  9.  Attenuation of microwave in ICP plasma to when the power is 500 W

    图  10  功率为600 W时ICP等离子体对电磁波的衰减变化

    Figure  10.  Attenuation of microwave in ICP plasma when the power is 600 W

    图  11  5.92~6.8 GHz频段平均衰减的变化情况

    Figure  11.  Variation of average attenuation in 5.92~6.8 GHz frequency band

    图  12  5.92~6.8 GHz频段衰减峰值的变化情况

    Figure  12.  Variation of attenuation peak of 5.92~6.8 GHz frequency band

    图  13  功率为400 W时等离子体对电磁波衰减的计算与实验对比

    Figure  13.  Comparison between calculation and experiment of electromagnetic wave attenuation by plasma at 400 W

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出版历程
  • 收稿日期:  2020-11-26
  • 修回日期:  2021-01-28
  • 网络出版日期:  2021-02-08

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