Volume 32 Issue 7
Jun.  2020
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Liu Hao, Ma Ping, Pu Yunti, et al. Impact of annealing on laser resistance of HfO2 films fabricated byALD, IBS and EBE techniques[J]. High Power Laser and Particle Beams, 2020, 32: 071002. doi: 10.11884/HPLPB202032.200006
Citation: Liu Hao, Ma Ping, Pu Yunti, et al. Impact of annealing on laser resistance of HfO2 films fabricated byALD, IBS and EBE techniques[J]. High Power Laser and Particle Beams, 2020, 32: 071002. doi: 10.11884/HPLPB202032.200006

Impact of annealing on laser resistance of HfO2 films fabricated byALD, IBS and EBE techniques

doi: 10.11884/HPLPB202032.200006
  • Received Date: 2020-01-08
  • Rev Recd Date: 2020-03-27
  • Publish Date: 2020-06-24
  • Annealing is one of the most accessible post-treatment techniques in high power laser coatings, however, the impact of annealing on laser resistance of the coatings is not clear until today. In this experiment, HfO2 films have been prepared by EBE, IBS and ALD techniques, respectively. The laser resistance of each film before and after annealing has been tested with the 1 064 nm Nd: YAG laser according to ISO 21254. It is found that the ALD HfO2 film has the highest LIDT, while the IBS HfO2 film has the lowest. It is also found that the laser resistance of all the samples does not benefit from the 300 ℃ annealing, moreover, the laser resistance of the ALD HfO2 film decreases tremendously after annealing at 500 ℃. The experimental results are discussed and analyzed.
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