Stress analysis of high reflective multilayers fabricated by magnetron sputtering
-
摘要: 为制备硼边附近6.7 nm波长的极紫外高反射率多层膜反射镜,研究了Mo2C/B4C,Mo/B4C周期多层膜,重点解决薄膜应力难题。采用直流磁控溅射技术制备了膜层厚度为30 nm的Mo,Mo2C,B4C单层膜,周期厚度为3.5 nm,30对的Mo2C/B4周期多层膜。利用台阶仪测试了镀膜前后基底面形,计算并比较了不同薄膜样品的应力值。结果表明Mo2C/B4C多层膜压应力要远小于Mo/B4C多层膜,且成膜质量与Mo/B4C相当。因此Mo2C/B4C是应用于6.7 nm反射镜较好的多层膜材料组合。C,Mo/B4CAbstract: In order to fabricate high reflective multilayer mirrors for 6.7 nm wavelength near B absorption edge, a series of Mo, B4C, Mo2C thin films and Mo/B4C, Mo2C/B4C multilayers were deposited using direct current (DC) magnetron sputtering technology. The thickness for all of the thin films is 30 nm, and the bi-layer number for both multilayer is 30. The period thickness is 3.5 nm, which were measured by grazing incidence-X-ray reflection(GIXR). Surface profiles before and after deposition were measured with a stylus profiler and the stresses were calculated by Stoney formula. The results indicate that all of the thin films show compressive stress, in which the B4C layer shows the biggest stress, and the compression stress of Mo2C layer is larger than that of the Mo layer. Both of the multilayer films show the compressive stress. Mo2C/B4C periodic multilayers have a smaller stress than Mo/B4C multilayers with a sharp interface and are a good material combination for extreme ultraviolet multilayer optics with a large number of bilayers.
-
Key words:
- stress /
- multilayer /
- magnetron sputtering /
- extreme ultraviolet
点击查看大图
计量
- 文章访问数: 1442
- HTML全文浏览量: 292
- PDF下载量: 423
- 被引次数: 0