Improve K9 glass substrate damage threshold by HF etchingHF
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摘要: 针对K9玻璃基板的HF酸化学腐蚀工艺开展研究,标定了40%和2%高低两种体积分数的HF酸的腐蚀速率；分析了基板表面形貌随腐蚀深度的变化规律；研究了腐蚀时间、HF酸体积分数、超声波工艺对激光损伤阈值的影响,提出了能够有效减少损伤敏感的氟硅盐沉淀、提高损伤阈值的优化腐蚀清洗工艺流程。采用优化的腐蚀清洗工艺流程进行了实验验证,结果表明用体积分数为2%的HF酸在高温和超声波条件下腐蚀90 s后,测得1064 nm波长激光作用下K9基板抗激光损伤阈值提高了75%。Abstract: This paper carries out researches on the chemical etching of HF acid on K9 substrates and calibrates the etching rate of HF acid under the concentration of 40% and 2%. The relationship between surface morphology of substrate and etching depth is analyzed and the effect of etching time, concentration of HF acid, ultrasonic cleaning on the LIDT is investigated. The optimized etching cleaning process which can reduce the deposition of silicate effectively and improve the LIDT is proposed. Finally, the optimized etching cleaning process is used to test and verify the experimental results. The results indicate that under the irradiation of 1064 nm laser, the LIDT of K9 substrates etched for 90s under the condition of high temperature and ultrasonic with 2% concentration HF acid is 75% higher than the original one.
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Key words:
- HF acid etching /
- K9 substrate /
- damage threshold /
- ultrasonic /
- roughness
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