抛光颗粒尺度均匀性对射流去除特性的影响

付文静; 芈绍桂; 张蓉竹

doi:10.11884/HPLPB201830.170295

抛光颗粒尺度均匀性对射流去除特性的影响

doi: 10.11884/HPLPB201830.170295

四川大学电子信息学院, 成都 610064

详细信息

作者简介:
付文静(1992—)，女，硕士，主要从事先进光学制造技术; fwjwangyi@126.com

通讯作者:
张蓉竹(1975—)，女，教授，博士生导师，主要从事精密光学制造与检测研究; zhang-rz@scu.cn

中图分类号: TH16;TH74
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- 被引次数: 0
出版历程
- 收稿日期: 2017-07-16
- 修回日期: 2017-09-26
- 刊出日期: 2018-01-15

Influence of uniformity of polishing particle size on material removal characteristics in fluid jet polishing

School of Electronics and Information Engineering, Sichuan University, Chengdu 610064, China

摘要

摘要: 基于单喷嘴射流抛光去除机理，研究了抛光颗粒尺度分布理想均匀时，颗粒直径和抛光液质量分数变化对冲击去除分布的影响。在此基础上，考虑到实际加工过程中，抛光粉颗粒不可避免地存在分布不均匀的情况，在非理想不均匀条件下，提出了一种分析颗粒尺度的材料去除特性模型，重点研究了不同颗粒尺度分布范围对材料去除特性的影响。结果表明：在理想状态下，冲击去除随着抛光颗粒直径的增大而减小，随着抛光液质量分数的增大而增大。当颗粒直径随机分布时，材料去除量将出现明显的波动，抛光液质量分数的增大使去除量波动也增加，去除量波动的大小与抛光粉颗粒的平均直径直接相关，且与理想均匀状态下的去除特性相比，颗粒分布不均匀性使得材料的去除量有所增大。
- 抛光颗粒 /
- 冲击去除 /
- 不均匀性 /
- 去除量 /
- 质量分数
Abstract: Based on the jet polishing mechanism of single nozzle structure, the impact caused by the variations of particle diameter and polishing liquid concentration is studied. In consideration of the actual manufacture process, the particle diameters is nonuniform, thus a theoretical model has been established to discuss the material removal characteristic at the non-ideal condition.The impact of different particle size distribution on the material removal characteristics is mainly investigated. The results show that the material removal amount decreases with the increase of particle diameters, it increases with the increase of the mass concentration of the polishing solution. In addition, when the particle size is randomly distributed, significant fluctuation appears in material removal. The magnitude of the fluctuation is directly related to the average diameter of the polishing particles. Compared with the ideal uniform distribution, the removal amount caused by the un-uniform particles is relatively bigger.
- polishing particles /
- impinging removal /
- non-uniformity /
- removal amount /
- mass concentration

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图 1 单喷嘴结构图

Figure 1. Schematic diagram of Single nozzle

下载: 全尺寸图片幻灯片

图 2 冲击速度为20 m/s时, 不同质量分数的冲击去除分布

Figure 2. Impinging removal distribution of different concentrations at impinging velocity of 20 m/s

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图 3 不同抛光颗粒直径下的冲蚀云图

Figure 3. Erosion nephogram for different polishing particle diameter

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图 4 冲击速度为20 m/s时，不同抛光颗粒直径下的冲击去除分布

Figure 4. Impinging removal distribution of multiple particle diameters at impinging velocity of 20 m/s

下载: 全尺寸图片幻灯片

图 5 颗粒半径均值不同时，颗粒分布不均匀性与去除量的关系

Figure 5. Relationship between particle distribution inhomogeneity and removal amoun for different average particle radius

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图 6 抛光液质量分数不同时，颗粒分布的不均匀性与去除量的关系

Figure 6. Relationship between particle distribution inhomogeneity and removal amount for different concentration of polishing liquid

下载: 全尺寸图片幻灯片

表 1 石英玻璃参数

Table 1. Quartz glass parameters

material	H/GPa	E/GPa	J/(kg·K)	ρ/(g·cm^-3)	ω/(m·K)
SiC	-	450	1 266.93	3.22	16.7
fused silicon	7.1	73	670	2.2	1.4

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参考文献(9)

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