Fabrication of high-efficiency convex blazed gratings by swing ion beam etching
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摘要: 通过摆动离子束刻蚀方法，制作了用于短波红外高光谱成像光谱仪的凸面闪耀光栅。该方法通过在光栅子午方向上进行摆动刻蚀，解决了凸面光栅子午方向的闪耀角一致性问题。建立了摆动刻蚀模型来分析摆动速度、束缝宽度等工艺参数对槽型演化的影响，并计算了优化的刻蚀工艺参数。制备了基底尺寸为67 mm，曲率半径为156.88 mm，刻线密度为45.5 gr/mm，闪耀角为2.2°的凸面闪耀光栅，并对其表面形貌及衍射效率进行了测量。实验结果表明，摆动刻蚀法能够制作出闪耀角一致性好、衍射效率高的小闪耀角凸面光栅，满足成像光谱仪对光谱分辨率和便携性的使用要求。Abstract: We use the swing ion-beam etching method to fabricate short wave infrared convex blazed gratings. This method solves the consistency problem of blaze angles by swing etching through the meridian direction of the gratings. A geometric model is built to analyze the influence of swinging speed and beam slit width on groove evolution. Convex gratings with a 45.5 gr/mm groove density, 67 mm aperture, 156.88 mm radius of curvature and 2.2° blaze angle have been fabricated and measured. Experimental results validate that high-efficiency convex gratings of small blaze angle and high groove consistency can be produced by swing etching to satisfy the requirements for high spectral resolution and miniaturization of imaging spectrometers.
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Key words:
- convex blazed gratings /
- swing etching /
- diffraction efficiency /
- imaging spectrometer
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图 3 束缝宽度大于临界宽度时槽形演化
Figure 3. Groove evolution when the slit width is bigger than the critical width
图 5 AFM横断面图与理论模型计算出的光栅槽形对比
Figure 5. Measured (solidline) and simulated (dashedline) cross-section images of grating samples
图 6 样品的衍射效率实测结果与理论模型计算结果对比
Figure 6. Measured and calculated results of diffraction efficiency of samples
图 8 样品No.5和样品No.6的实测衍射效率与曲线理想衍射效率曲线的对比
Figure 8. Comparison between measured and ideal diffraction efficiency of No.5 and No.6
图 9 光栅表面不同位置的原子力横断面图
Figure 9. Cross-section diagrams at different locations on the grating surface by AFM
图 10 样品No.8的实测衍射效率曲线
Figure 10. Comparison of the measured diffraction efficiency of sample No.8 with the ideal efficiency
表 1 摆动刻蚀凸面光栅的最佳设计参数
Table 1. Designed parameters of the convex grating
aperture/mm radius/mm period/μm mask height/nm mask width/nm duty cycle blaze angle/(°) roughness/nm 67 156.88 21.978 1000 5 498.8 1∶4 2.2±0.05 ＜1 
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表 2 摆动刻蚀工艺参数
Table 2. Swing etching parameters
ion energy/eV beam current/mA accelerate voltage/V working gas ratio of Ar∶CHF3 effective etching time/min 500 250 250 5∶3 165.88
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表 3 基底表面不同位置的闪耀角
Table 3. Blaze angles at different locations on the substrate surface
coordinate/mm blaze angle/(°) coordinate/mm blaze angle/(°) coordinate/mm blaze angle/(°) (a)(-30, -30) 2.158 3 (d)(0, -30) 2.207 2 (g)(30, -30) 2.172 3 (b)(-30, -0) 2.170 1 (e)(0, 0) 2.205 7 (h)(30, 0) 2.167 1 (c)(-30, 30) 2.163 1 (f)(0, 30) 2.197 6 (i)(30, 30) 2.159 6
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