Impact of annealing on laser resistance of HfO2 films fabricated byALD, IBS and EBE techniques
-
摘要: 结合自身实验条件采用电子束蒸发（EBE）、离子束溅射（IBS）和原子层沉积（ALD）三种工艺制备了HfO2薄膜，对其进行退火实验，采用1 064 nm Nd: YAG激光测定了即时沉积和退火后各HfO2薄膜的抗激光损伤能力。研究发现，ALD HfO2薄膜的激光损伤阈值最高，EBE HfO2薄膜次之，IBS HfO2薄膜的损伤阈值最低；300 ℃退火对各工艺薄膜抗激光损伤能力的影响均为负面，500 ℃退火则会显著降低ALD HfO2薄膜的抗激光损伤能力。Abstract: Annealing is one of the most accessible post-treatment techniques in high power laser coatings, however, the impact of annealing on laser resistance of the coatings is not clear until today. In this experiment, HfO2 films have been prepared by EBE, IBS and ALD techniques, respectively. The laser resistance of each film before and after annealing has been tested with the 1 064 nm Nd: YAG laser according to ISO 21254. It is found that the ALD HfO2 film has the highest LIDT, while the IBS HfO2 film has the lowest. It is also found that the laser resistance of all the samples does not benefit from the 300 ℃ annealing, moreover, the laser resistance of the ALD HfO2 film decreases tremendously after annealing at 500 ℃. The experimental results are discussed and analyzed.
-
图 3 采用不同沉积方式制备的HfO2薄膜的色散
Figure 3. Dispersion of HfO2 films deposited by different techniques
图 6 500 ℃退火后ALD HfO2薄膜在10个脉冲和10 000个脉冲作用下的激光损伤概率
Figure 6. The laser damage probability of 500 ℃ annealed ALD HfO2 film irradiated by 10 pulses and 10 000 pulses
图 8 缺陷诱导激光损伤模型中的缺陷吸收率对局部温升的影响
Figure 8. Impact of defect on the local temperature in the defect-induced laser damage model
表 1 不同退火温度的ALD HfO2薄膜的弱吸收
Table 1. The weak absorption of ALD HfO2 film annealed at different temperature
sample as-deposited/10−6 300 ℃ annealed/10−6 500 ℃ annealed/10−6 ALD HfO2 film 13.2 19.1 1 800 
下载: 导出CSV
-
[1] 邵建达, 戴亚平, 许乔. 惯性约束聚变激光驱动装置用光学元器件的研究进展[J]. 光学 精密工程, 2016, 24(12):2889-2895. (Shao Jianda, Dai Yaping, Xu Qiao. Progress on optical components for ICF laser facility[J]. Optics and Precision Engineering, 2016, 24(12): 2889-2895 doi: 10.3788/OPE.20162412.2889 [2] Stolz C J. The National Ignition Facility: The world’s largest optical system[C]//Proc of SPIE. 2007, 6834: 683402. [3] Campbell J H, Hawley-Fedder R A, Stolz C J, et al. NIF optical materials and fabrication technologies: an overview[C]//Proc of SPIE.2004, 5341: 84-101. [4] 余悦. 邦德激光30 000 W超高功率激光切割机全球首发[OL]. 今日制造与升级, 2019: 36-37.Yu Yue. The debut of 30 000 W super high power laser cutting machine of Bodor Laser. Manufacture & Upgrading Today, 2019: 36-37 [5] Stolz C J, Thomas M D, Griffin A J. BDS thin film damage competition[C]//Proc of SPIE. 2008: 71320C. [6] Rudolph W, Emmert L, Sun Z, et al. Laser damage in thin films-What we know and what we don’t[C]//Proc of SPIE. 2013: 888516. [7] Stolz C J, Sheehan L M, von Gunten M K, et al. Advantages of evaporation of hafnium in a reactive environment formanufacture of high-damage-threshold multilayer coatings by electron-beam-deposition[C]//Advances in Optical Interference Coatings, International Society for Optics and Photonics. 1999, 3738: 318-324. [8] Andre B, Poupinet L, Ravel G. Evaporation and ion assisted deposition of HfO2 coatings: Some key points for high power laser applications[J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2000, 18(5): 2372-2377. [9] 余振, 张伟丽, 朱瑞, 等. 反应电子束蒸发HfO2薄膜的结构、光学、化学和抗激光损伤特性研究[J]. 中国激光, 2020, 47:0403002. (Yu Zhen, Zhang Weili, Zhu Rui, et al. Studies on optical, structural, chemical and laser damage resistant properties of HfO2 films deposited by reactive electron beam evaporation[J]. Chinese Lasers, 2020, 47: 0403002 doi: 10.3788/CJL202047.0403002 [10] Ristau D, Gross T. Ion beam sputter coatings for laser technology[C]//Proc of SPIE.2005: 596313. [11] Mende M, Jensen L, Ehlers H, et al. Laser induced damage of pure and mixture material high reflectors for 355 nm and 1064 nm wavelength[C]//Proc of SPIE. 2011: 816821. [12] Wei Yaowei, Pan Feng , Zhang Qinghua, et al. Atomic layer deposition for fabrication of HfO2/Al2O3 thin films with high laser induced damage thresholds[J]. Nano Express, 2015, 10(44): 1-7. [13] Jensen, L, Maedebach H, Maula J, et al. Laser induced damage threshold and optical properties of TiO2 and Al2O3-coatings prepared by atomic layer deposition[C]//Proc of SPIE. 2012: 853010. [14] 刘志超, 郑轶, 潘峰, 等. 1064 nm激光预处理对HfO2/SiO2反射膜损伤形态转化影响研究[J]. 红外与激光工程, 2017, 46:0606003. (Liu Zhichao, Zheng Yi, Pan Feng, et al. Effect of 1064 nm laser conditioning on damage morphology change process on HfO2/SiO2 reflective film[J]. Infrared and Laser Engineering, 2017, 46: 0606003 doi: 10.3788/IRLA201746.0606003 [15] 代福, 杨李茗. HfO2/SiO2多层高反膜激光预处理技术[J]. 强激光与粒子束, 2013, 25(4):929-934. (Dai Fu, Yang Liming. Laser conditioning methods for hafnia silica multilayer high-reflective coatings[J]. High Power Laser and Particle Beams, 2013, 25(4): 929-934 doi: 10.3788/HPLPB20132504.0929 [16] 代福, 杨李茗. 激光预处理中薄膜损伤形貌对预处理效果的影响[J]. 红外与激光工程, 2013, 42(1):190-194. (Dai Fu, Yang Liming. Effects of damaged appearance of coatings on its conditioning during laser conditioning[J]. Infrared and Laser Engineering, 2013, 42(1): 190-194 doi: 10.3969/j.issn.1007-2276.2013.01.035 [17] Tan T, Liu B, Wu Z, et al. Annealing effects on structural, optical properties and laser induced damage threshold of MgF2 thin films[J]. Acta Metall Sin, 2017, 30(1): 73-78. doi: 10.1007/s40195-016-0479-x [18] Xu Cheng, Dong H, Ma J, et al. Influences of SiO2 protective layers and annealing on the laser-induced damage threshold of Ta2O5 films[J]. Chinese Optics Letters, 2008, 6(3): 228-230. doi: 10.3788/COL20080603.0228 [19] Jena S, Tokas R, Rao K, et al. Annealing effects on microstructure and laser induced damage threshold of HfO2/SiO2 multilayer mirrors[J]. Appl Opt, 2016, 55(22): 6108-6114. doi: 10.1364/AO.55.006108 [20] 许宁, 赵泉, 刘伟, 等. 不同退火温度对HfO2薄膜结构和性能的影响[J]. 硅酸盐通报, 2015, 34(S1):215-217. (Xu Ning, Zhao Quan, Liu Wei, et al. Influence of annealing temperature on structure and properties of hafnium dioxide films[J]. Bulletin of the Chinese Ceramic Society, 2015, 34(S1): 215-217 [21] 田光磊, 黄建兵, 贺洪波, 等. 退火对ZrO2薄膜微结构及激光损伤阈值的影响[J]. 强激光与粒子束, 2005, 17(2):217-221. (Tian Guanglei, Huang Jianbing, He Hongbo, et al. Effect of annealing on microstructure and laser induced damage threshold of ZrO2 coatings[J]. High Power Laser and Particle Beams, 2005, 17(2): 217-221 [22] Xu Cheng, Xiao Qiling, Ma Jianyong, et al. High temperature annealing effect on structure, optical property and laser-induced damage threshold of Ta2O5 films[J]. Appl Surf Sci, 2008, 254(20): 6554-6559. doi: 10.1016/j.apsusc.2008.04.034 [23] 刘浩, 潘峰, 卫耀伟, 等. 缺陷对HfO2薄膜的激光弱吸收与损伤阈值的影响[J]. 应用光学, 2015, 36(2):314-320. (Liu Hao, Pan Feng, Wei Yaowei, et al. Influence of defects in HfO2 film on absorptance and LIDT measurements[J]. Journal of Applied Optics, 2015, 36(2): 314-320 doi: 10.5768/JAO201536.0207004 -
点击查看大图
图(8) / 表(1)
计量
- 文章访问数: 1785
- HTML全文浏览量: 550
- PDF下载量: 82
- 被引次数: 0
