Electric field enhancement effect and damage characteristics of nodular defect in 45° high-reflection coating
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摘要: 研究设计和制备了中心波长为1 064 nm的45°多层膜反射镜，通过数值仿真结合实验，对薄膜中节瘤缺陷引起的电场增强效应及其对薄膜抗激光损伤性能的影响进行了研究。结果表明：当1 064 nm激光从右至左45°斜入射时，电场增强效应主要出现在节瘤缺陷的表层及其左侧轮廓中部，电场增强效应随节瘤缺陷尺寸增大而增强。实验上，在清洁的基板表面喷布单分散SiO2微球作为人工节瘤种子，采用电子束蒸发制备法完成多层全反膜的制备，采用R-on-1方式对薄膜样品进行激光损伤测试。结果表明，薄膜的损伤阈值随着节瘤缺陷尺寸增加而减小。通过综合分析电场增强效应、薄膜损伤测试结果及损伤形貌特征得出，薄膜损伤阈值降低是由于节瘤缺陷和薄膜中微缺陷共同作用的结果。Abstract: Nodular defect is one of the most common defects that affect the laser damage resistance of optical thin films. It has been an important research object in the field of high power laser thin films at home and abroad. 45° multilayer mirrors with a central wavelength of 1 064 nm were designed and fabricated. Through numerical simulations and experiments, the electric field enhancement effect(EFEE) caused by nodular defect and its influence on the laser damage resistance of the film were studied. The results show that when the 1 064 nm laser is incident obliquely from right to left at 45°, the EFEE mainly appears in the surface layer of the nodular defect and the middle of its left profile. The EFEE increases with the size of nodule defect. In the experiment, mono-disperse SiO2 microspheres were sprayed on the surface of clean substrates as the artificial nodule seeds, the multilayer high reflection coatings were prepared by electron beam evaporation, and the laser damage resistance of the samples was tested by R-on-1 method. By comprehensively analyzing the experiment results, it is concluded that the damage threshold reduction of coatings is due to the nodular defects and micro-defects in the coatings, and the damage threshold of coatings decreases with the increase of nodular defect size.
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图 1 45°高反膜电场强度分布
Figure 1. Electric field intensity （EFI） distribution of 45° HR coating
图 2 不同直径节瘤缺陷的s光和p光电场增强效应
Figure 2. Electric field enhancement effects of nodules with different diameters under s and p polarized light irradiation
图 8 节瘤喷溅坑的表面和截面形貌图
Figure 8. Surface morphology and cross-section images of nodule pits
表 1 不同区域的电场强度
Table 1. The electric field intensity in different regions
seed diameter/μm electric field intensity s-polarized p-polarized region 1 region 2 region 3 region 1 region 2 region 3 0.5 3.78 4.59 6.37 5.14 3.06 4.06 1 5.99 6.75 5.65 9.14 8.01 5.63 2 10.43 10.69 7.38 23.55 16.07 5.00 
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表 2 样品参数
Table 2. Sample parameters
sample number seed diameter d/μm nodule diameter D/μm coating thickness t/μm coefficient c A 0.5 3.5±0.2 ～6.75 3.62 B 1 4.8±0.2 3.41 C 2 7.0±0.2 3.63
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