Attenuation characteristics of electromagnetic wave in inductive coupled plasma based on variation of discharge power
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摘要: 射频电感耦合等离子体(ICP)放电方式能够在较宽的压强范围内产生大面积、密度高的等离子体，在对电磁波衰减应用中具有较大优势。通过研究ICP等离子体与电磁波相互作用的过程，改进闭式等离子体模型，建立电磁波在非均匀等离子体中传播的分层计算模型，对实测诊断分布情形下等离子体与电磁波的相互作用进行研究，得到不同功率条件下电磁波衰减的变化情况；提出射频电感耦合闭式等离子体用于电磁波衰减的方法并实验验证，基于等离子体覆盖金属平板的测量模型，在实验室内搭建了以金属板为衬底的弓形微波反射测试系统，研究了闭式等离子体对4～8 GHz频段范围内微波反射的作用特性，以及不同射频功率对微波反射的影响规律，并将实验测量与计算结果进行对比分析。实验表明，通过功率调节，电感耦合闭式等离子体对5.92～6.8 GHz频带电磁波具有明显的衰减作用。Abstract: The application of Inductively Coupled Plasma (ICP) can cause a wide range high density plasma and has great advantages in electromagnetic wave attenuation. Studying the process of interaction between ICP and electromagnetic wave, we established the electromagnetic wave propagation in inhomogeneous plasma, adopted hierarchical model for the diagnosis of the interaction of plasma and electromagnetic wave, and studied the electromagnetic wave attenuation under different conditions of input power. The experiment method of inductively coupled plasma for attenuation electromagnetic wave was proposed. Based on the model of plasma covering over the metal plate, the arch system for measurement of microwave reflectivity of plasma was established. The interaction of closed-plasma and electromagnetic wave with a bandwidth of 4−8 GHz was studied, the effect on microwave reflection of different rf power was evaluated analyzed, and the experimental measurement and calculation results were analyzed. The experimental results show that the inductively coupled plasma attenuates the electromagnetic wave in 5.92−6.8 GHz band obviously by power regulation.
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图 1 闭式等离子体分层计算模型示意图
Figure 1. Schematic diagram of a closed plasma hierarchical calculation model
图 2 平板型ICP发生装置的放电腔室与天线示意图和实物图
Figure 2. Schematic diagram and picture of discharge chamber and antenna of flat plate ICP generator
图 3 闭式等离子体电子密度测量值与拟合结果
Figure 3. Electron density measurement and fitting results of closed plasma
图 6 功率为200 W时ICP等离子体对电磁波的衰减变化
Figure 6. Attenuation of microwave in ICP when the power is 200 W
图 7 功率为300 W时ICP等离子体对电磁波的衰减变化
Figure 7. Attenuation of microwave in ICP when the power is 300 W
图 8 功率为400 W时ICP等离子体对电磁波的衰减变化
Figure 8. Attenuation of microwave in ICP plasma when the power is 400 W
图 9 功率为500 W时ICP等离子体对电磁波的衰减变化
Figure 9. Attenuation of microwave in ICP plasma to when the power is 500 W
图 10 功率为600 W时ICP等离子体对电磁波的衰减变化
Figure 10. Attenuation of microwave in ICP plasma when the power is 600 W
图 11 5.92～6.8 GHz频段平均衰减的变化情况
Figure 11. Variation of average attenuation in 5.92～6.8 GHz frequency band
图 12 5.92～6.8 GHz频段衰减峰值的变化情况
Figure 12. Variation of attenuation peak of 5.92～6.8 GHz frequency band
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