脉冲压缩光栅的激光损伤机理及阈值提升技术研究进展

白清顺; 孙浩; 李玉海; 张鹏; 杜云龙

doi:10.11884/HPLPB202234.210413

脉冲压缩光栅的激光损伤机理及阈值提升技术研究进展

doi: 10.11884/HPLPB202234.210413

哈尔滨工业大学机电工程学院，哈尔滨 150001

基金项目: 国家自然科学基金委-中国工程物理研究院联合基金项目(U2030109)，国家自然科学基金项目(52075129)

详细信息

通讯作者:
白清顺，Qshbai@hit.edu.cn

中图分类号: TN248
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- 被引次数: 0
出版历程
- 收稿日期: 2021-07-06
- 修回日期: 2022-05-10
- 录用日期: 2022-05-24
- 网络出版日期: 2022-05-26
- 刊出日期: 2022-07-20

Research progress on laser-induced damage mechanism and threshold improvement of pulse compression gratings

School of Mechanical and Electrical Engineering, Harbin Institute of Technology, Harbin 150001, China

摘要

摘要:
总结了激光辐射条件下脉冲压缩光栅的激光诱导损伤机理，探究了表面形貌、加工方式、结构缺陷以及表面污染等因素对光栅损伤造成的影响，从微观损伤机理的角度阐释了产生损伤的内在原因。在脉冲压缩光栅的激光预处理、加工工艺及表面污染物的去除等方面，分析了实现光栅损伤阈值提升的内在因素，给出了提升光栅损伤阈值的技术措施。根据影响光栅损伤阈值的因素，提出在光栅运行过程中采用多种措施组合的方式来提升光栅的激光诱导损伤阈值。脉冲压缩光栅激光损伤机理和阈值的研究对脉冲压缩光栅系统的稳定运行具有实践意义，为激光装置高能量密度的输出奠定基础。最后，提出了光栅激光诱导损伤研究的科学与技术问题，为脉冲压缩光栅激光诱导损伤阈值的提升提供新的思路，服务于重大科学装置和重要技术领域的发展。
- 脉冲压缩光栅 /
- 激光诱导损伤阈值 /
- 损伤机理 /
- 阈值提升 /
- 污染物
Abstract:
The damage of pulse compression gratings is the key factor offecting the stable operation and power improvement of chirped pulse amplification system. In this paper, the laser-induced damage mechanism of pulse compression grating under laser radiation is summarized, the effects of surface morphology, processing mode, structural defects and surface pollution on grating damage are explored, and the internal causes of damage are explained from the perspective of micro damage mechanism. In the aspects of laser pretreatment, processing technology and surface pollutant removal of pulse compression grating, the internal factors to improve the grating damage threshold are analyzed, and the technical measures to improve the grating damage threshold are given. A combination of various measures is proposed to improve the laser-induced damage threshold of the grating. The research on laser damage mechanism and threshold of pulse compression grating has practical significance for the stable operation of pulse compression grating system and lays a foundation for the output of high energy density of laser device. Finally, this paper puts forward the scientific and technical problems of grating’s laser-induced damage research, which provides new ideas for improving the laser-induced damage threshold of pulse compression grating, and help the development of major scientific devices and important technical fields.
- pulse compression gratings /
- laser-induced damage threshold /
- damage mechanism /
- threshold improvement /
- pollution

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图 1 在激光辐射下结节缺陷形貌

Figure 1. Nodular defect morphology under laser irradiation

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图 2 光栅中结节缺陷的分布情况

Figure 2. Distribution of nodular defects in gratings

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图 3 s偏振Ti蓝宝石激光器在65°入射角，脉冲持续时间32 fs时，不同位置结节缺陷引起的光栅损伤形貌及电场分布^[41]

Figure 3. Grating damage morphology and electric field distribution caused by nodular defects at different positions of s-polarized Ti:Sapphire laser with an incident angle of 65° and a pulse duration of 32 fs^[41]

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图 4 在120 fs, 796 nm, 10 Hz激光作用下，光栅膜层的损伤演变^[40]

Figure 4. Damage evolution of grating film under irradiation of 120 fs, 796 nm, 10 Hz laser^[40]. (a)(d) nano bumps; (b)(e) surface roughness; (c) nano cracks; (f) film falling off

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图 5 光栅膜层的分布方式

Figure 5. Distribution of grating films

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图 6 Ti蓝宝石激光在频率1 kHz，脉冲持续时间60 fs时，不同激光注入能量及膜层沉积方式的光栅损伤形貌^[50]

Figure 6. Grating damage morphologies of Ti: Sapphire laser with different laser injection energy and film deposition methods at a frequency of 1 kHz and a pulse duration of 60 fs^[50]

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图 7 Ti蓝宝石激光在频率1 kHz，脉冲持续时间60 fs时，电子束蒸发制备的金属光栅损伤形貌^[51]

Figure 7. Damage morphology of ACG prepared by electron beam evaporation with Ti: Sapphire laser at frequency 1 kHz and pulse duration 60 fs^[51]

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图 8 SiO₂溶胶凝胶膜损伤阈值随污染时间的变化情况^[63]

Figure 8. Changes of LIDT of SiO₂ sol-gel film with pollution time^[63]

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图 9 脉冲持续时间8.6 ps时，1.48 J/cm² 的颗粒污染物对MMDG的损伤形貌^[64]

Figure 9. Damage morphologies of MMDG with 1.48 J/cm₂ of particulate pollutants at pulse duration of 8.6 ps^[64]

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图 10 典型的脉冲压缩光栅制备工艺流程

Figure 10. Typical pulse compression grating preparation process

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图 11 在353 K、423 K、503 K以及573K退火温度下HfO₂薄膜的激光诱导损伤阈值^[65]

Figure 11. Laser-induced damage thresholds of HfO₂ films at annealing temperatures of 353 K, 423 K, 503 K and 573 K^[65]

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图 12 基底表面的元素含量^[69]

Figure 12. Elements content of the surface of the substrates^[69]

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图 13 Ti蓝宝石激光在频率10 Hz，脉冲持续时间35 fs时，单脉冲辐射及双脉冲辐射状态下损伤状态^[70]

Figure 13. Damage state of Ti: Sapphire laser in the state of single-pulse and double-pulse radiation at a frequency of 10 Hz and a pulse duration of 35 fs^[70]

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图 14 光栅清洗前后扫描电镜图^[76]

Figure 14. SEM images of grating before and after cleaning^[76]

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图 15 引入气体在真空及不同压力条件下的损伤概率^[80]

Figure 15. Damage probability of introduced gas under vacuum and different pressures^[80]

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图 16 脉冲压缩光栅激光诱导损伤研究的科学与技术问题

Figure 16. Scientific and technical issues in the research on laser-induced damage of pulse-compressed gratings

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表 1 激光诱导损伤阈值影响因素的对比

Table 1. Comparison of influencing factors of laser-induced damage threshold

influencing factor	damage forms	damage mechanism
nodular defect^[37-40]	(1) under the grating column: the central grating column disappear, the adjacent two grating columns partially disappear (2) under the grating groove: two adjacent grating columns disappear	with the increase of electric field strength, the collision effect of free electrons is enhanced, which leads to avalanche ionization
laser injection energy and pulse number^[41-42]	damage process: bump generation, more bumps, nano crack, film falling off	the bumps are formed by nodular defects, the electric field is enhanced, the free electron collision is intensified, the nano cracks are formed, and the film finally falls off
film deposition process^[49-51]	(1) electron beam evaporation preparation: bubble formation, nano crack generation and propagation, and final film peeling off	the photoresist ionizes free electrons to cause bubbles; with the increase of electric field strength, the nano cracks and the film peeling off
film deposition process^[49-51]	(2) magnetron sputtering: melting of films and microstructures^[49-51]	ionization of free electrons; as the radiation time increases, the number of free electrons increases, the collision intensifies, and the radiation energy absorption causes the gold film to melt
surface contamination^[56-57]	organic contamination carbonization, surface microstructure damage	the contamination absorbs radiation energy and excites free electrons; with the increase of electric field strength, electron collision and avalanche ionization are intensified

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表 2 激光损伤阈值提升工艺方案的比较

Table 2. Comparison of laser damage threshold enhancement process schemes

technological process	advantages	disadvantages
high temperature annealing^[65-66]	the film performance is improved; significant LIDT increase	annealing temperature and time have great influence on the LIDT; the operation is complicated
ion beam etching^[67-68]	remove of pollutants; reduction of defect density	potential damage to the surface
nanosecond laser pre-irradiation^[70]	easy operation; on-line operation; removal of pollutants	heat accumulation on grating surface caused by long time pre-radiation
cleaning of PCG^[72-74]	significant effect of threshold promotion; easy operation; plasma cleaning can be used to realize on-line cleaning	the pollutants produced in operation cannot be removed; chemical cleaning method is difficult to realize on-line cleaning
introduction of O₂ and N₂^[80]	easy operation; good economy; on-line operation	introduction of impurity gas reduces the vacuum degree, resulting in laser dispersion

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