Vacuum performance of Ti-Zr-V getter films deposited on narrow tubes
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摘要: 利用直流磁控溅射方法在单晶硅片和内径为22 mm、长度分别为500 mm和1500 mm的银铜管道内壁镀制了Ti-Zr-V非蒸散型吸气剂薄膜，并对镀膜管道的极限真空进行了测量。结果显示：在180 ℃下激活24 h后，镀制了Ti-Zr-V薄膜真空管道的极限真空度可以达到9.2×10−10 Pa。在关闭测试系统和离子泵的阀门后，系统仅依靠Ti-Zr-V薄膜的吸气依然能够维持在9×10−9 Pa很长时间。利用测试粒子蒙特卡罗法对薄膜的抽速和容量进行了分析和测量，结果显示，Ti-Zr-V薄膜对CO的初始粘附系数最大可以达到0.3，容量可以达到1.2个分子层。Abstract: Non-evaporable getter films are widely used in particle accelerators. It has become an integral part of many particle accelerators. Ti-Zr-V films were deposited on Si substrates and straight and bent Ag-Cu tubes with an inner diameter of 22 mm by DC magnetron sputtering. After baked at 180 ℃ for 24 h, the ultimate vacuum of the coated tubes reached 9.2×10−10 Pa. The tubes with activated getter films maintained at 9×10−9 Pa after closing tubes and ion pump valve. The pumping speed and capacity of Ti-Zr-V films were measured by Test Particle Monte Carlo method. The results show that the best CO sticking probability reaches 0.3, with a pumping capacity of 1.2 monolayer.
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图 1 直流磁控溅射镀膜系统原理图
Figure 1. Schematic diagram of DC magnetron sputtering coating system
图 3 NEG薄膜管道抽速测试系统图
Figure 3. System diagram of the vacuum system for analyzing vacuum properties of the tubular NEG tube
图 4 Ti-Zr-V薄膜样品的（a）表面和（b）断面SEM图像和（c）EDS mapping图像
Figure 4. SEM surface (a), cross-sectional (b) and (c) EDS mapping images of Ti-Zr-V films
图 6 CO初始粘附系数和容量随激活温度的变化函数
Figure 6. Initial CO sticking probability and CO pumping capacity as a function of activation temperature
表 1 镀膜参数
Table 1. Coating parameters
working
pressure /Pasputtering
gasworking
current/Apulsed
frequency/kHzbased
pressure/Padepositing
time/hmagnetic field
strength/T1 Kr 0.1 50 1×10−5 8 0.02 
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表 2 极限真空测试结果
Table 2. Results of ultimate vacuum measurement
time/day pressure/Pa long tube short tube 1 2.08×10−9 9.26×10−9 10 2.04×10−9 1.77×10−8
close valve30 1.96×10−9 3.17×10−8 60 1.52×10−9 2.82×10−8 90 1.32×10−9 1.71×10−8 120 1.02×10−9 9.30×10−9 150 9.6×10−10 9.40×10−9 180 9.2×10−10 9.18×10−9 360 — 8.20×10−9
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