高功率固体激光装置负载问题研究进展

郑万国; 田野; 韩伟; 柴向旭; 邓学伟; 刘太祥; 廖威

doi:10.11884/HPLPB202335.220402

高功率固体激光装置负载问题研究进展

doi: 10.11884/HPLPB202335.220402

中国工程物理研究院激光聚变研究中心，四川绵阳 621900

基金项目: 国家自然科学基金青年基金项目（11904338）

详细信息

作者简介:
郑万国，wgzheng_caep@sina.com

通讯作者:
田　野，tianye8911@outlook.com

中图分类号: O434
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- 文章访问数: 801
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- 被引次数: 0
出版历程
- 收稿日期: 2022-11-30
- 修回日期: 2023-02-24
- 录用日期: 2023-02-24
- 网络出版日期: 2023-03-10
- 刊出日期: 2023-05-06

Research progress on loading capability of high-power solid-state laser facilities

Laser Fusion Research Center, CAEP, Mianyang 621900, China

摘要

摘要:
高功率固体激光装置的负载问题是制约装置建设与运行的瓶颈问题。在高通量紫外纳秒激光辐照下，熔石英后表面的损伤不断产生和增长，严重限制了装置的负载能力。在提升熔石英抗损伤性能的基础上修复既有损伤，循环使用光学元件，是现阶段提升装置负载能力的主要手段。主要介绍了国内外近年来在熔石英损伤的规律与机制、光学元件循环处理的支撑技术以及提升负载能力的新材料与新技术方面所取得的重要进展。
- 高功率激光装置 /
- 熔石英 /
- 激光损伤 /
- 化学刻蚀 /
- 损伤修复
Abstract:
The loading capability is a bottle-neck challenge in both the construction and operation of high-power laser facilities. Under high-fluence, nanosecond laser irradiation in the ultraviolet regime, damage sites are constantly witnessed initiating and growing on the rear surface of fused silica, severely limiting the loading capability of high-power lasers. Optics recycling which is based on improving the damage resistance of fused silica and mitigating the as-grown damage sites is currently the major strategy for improving the loading capability. This paper introduces the recent progress in the laws and mechanism of laser-induced damage in fused silica, the essential techniques supporting the optical recycling strategy and the new materials and techniques developed to improve the loading capability of high-power laser facilities.
- high-power laser facility /
- fused silica /
- laser-induced damage /
- chemical etching /
- damage mitigation

HTML全文

图 1 不同类型损伤的形貌^[10]

Figure 1. Morphology of different damage types^[10]

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图 2 熔石英损伤喷溅颗粒分布（(a)～(c)）与典型颗粒的SEM图像（(d)～(g)）^[19]

Figure 2. (a)～(c):Ejection distribution on the collector; (d)～(g): typical SEM images of the collected particles^[18]

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图 3 熔石英冲击导致喷溅过程分子动力学模拟^[22]

Figure 3. Molecular dynamics simulation of shock-induced ejection on silica surface

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图 4 三种金属元素污染的样品的吸收分布(扫描区域不同位置的相对吸收强度)^[27]

Figure 4. Absorption mapping images of three kinds of samples^[27]

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图 5 损伤区域尺寸随发次数量的增长^[8]

Figure 5. Obscurations growth vs shot number of damage site^[8]

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图 6 不同刻蚀次数下的熔石英损伤概率与损伤密度^[48]

Figure 6. Damage probability and damage density of fused silica etched different times^[48]

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图 7 不同激光参数下的损伤修复点形貌

Figure 7. Morphology of mitigated damage sites with different laser parameters

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图 8 V形结构的光收集器^[57]

Figure 8. Basic structure of a V-type beam dump^[57]

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图 9 不同表面处理工艺下的熔石英初始损伤概率^[60]

Figure 9. Damage initiation probability versus laser fluence at 355 nm, 5 ns for the virgin sample and the samples treated with different processes^[60]

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图 10 损伤点刻蚀后对8 J/cm²辐照损伤增长的抑制效果演示^[63]

Figure 10. Laser damage growth of an unetched site (site 1) and an etched site (site 2) on a same optics after flat-top-shaped ultraviolet laser irradiation with the wavelength of 351 nm, the duration of 5.0 ns and the fluence of 8.0 J/cm². The Site 2 is etched 24.0 h by using HF-based solution^[63]

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