Analyzing stray light on line structures of different critical dimensions based on Kirk test
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摘要: 采用Kirk测量法的杂散光模型研究了杂散光在不同线宽结构上杂散光的光强变化，通过图像对比度分析了杂散光对不同线宽结构的影响。基于Matlab软件仿真分析表明：线宽一定时，线条越稀疏，图像对比度越低，杂散光对成像图形分辨力的影响越大；线条线间比一定时，线宽尺寸越小，图像对比度越低，杂散光对成像图形分辨力的影响也越大。所以杂散光对线宽较小并且线条稀疏空间结构所成的图形造成的影响较大。光刻； Kirk测量法； 杂散光； 点扩散函数； 图像对比度Abstract: The Kirks stray light simulation model is adopted to study the variation of stray light on different line structures, and the effects of stray light on imaging of different line structures are analyzed according to be image contrast. The simulation based on in-house image processing software written in Matlab indicates that, imaging of a sparser line structure has a lower image contrast and is more susceptible to stray light when the critical dimension is fixed. When the ratio of line width and space is fixed, a smaller critical dimension will lead to a lower image contrast and stronger effect of stray light on image pattern. Therefore, the stray light has great influence on the image pattern of narrow and sparse line structure.
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Key words:
- opticallithography /
- kirktest /
- straylight /
- pointspreadfunction /
- imagecontrast
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