Abstract: Two new methods using metastable helium atomic beam to fabricate nanostructures are introduced. A metastable helium atomic beam effusing out of atom source is firstly cooled by transversally in cident laser. This well-collimated atomic beam traveling through the light standingwave whose direction is perpendicular to atomic beam is quenched, and channeling effect happens in atomic density distribution. In this paper the basic principle of this technique based on mask made of light and theoretical analysis as well as simulation results are given. The principle of another method based on physical mask and SAM(selfassembled monolayers) resists are presented, the SAM on substrate is destroyed by deposited metastable atoms on substrate, and the nanometer-scale structure will be fabricated wi