波长1064nm脉冲激光高阈值反射膜的研制
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摘要: 研究HfO2/SiO2高反射膜的制备工艺及其激光诱导损伤阈值的比较测试，分别采用了反应蒸镀HfO2、反应离子辅助蒸镀HfO2、反应离子辅助蒸镀金属Hf的源材料形成HfO2薄膜。采用这三种工艺制备了HfO2/SiO2高反射膜，在中心波长1064nm处，反射率 R≥99.5%，其中反应蒸镀HfO2/SiO2高反射膜损伤阈值最高，可达60J/cm2(1064nm，5ns)。
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关键词:
- HfO2/SiO2反射膜 /
- 激光诱导损伤阈值 /
- 电子束蒸发 /
- 等离子辅助沉积
Abstract: A series of HfO2/SiO 2 high reflective multilayers whose reflectiv ity are more than 99.5% at wavelength 1064nm are coated by three deposition methods. respectitely, and it is found that the method of the reactive electronic beam evaporation of hafnia got the multilayer samples with the hightest laser induced damage threshold 60J/cm２ for 1064nm, 5ns. -
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