Abstract: In order to achieve a better understanding of sputtering-deposition process, a hybrid simulation combining Fluid and Monte-Carlo model has been developed. An overview of the model is given and some typical results are presented. These results include: the densities and energy distributions of the plasma species, the contributions of different ionization mechanisms to the ionization of argon and sputtered atoms, the relative contributions of different plasma species to the sputtering process, the density distributions of sputtered atoms, the sputtering field and sputtered atom distributions versus energy and angle of argon ions, and the density profile of the thermalized sputtered atoms.