Nd薄膜靶表面氧化过程研究
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摘要: 用Auger电子能谱（AES）对X光激光实验使用的Nd薄膜靶的表面氧化进行了分析，结合Ar离子束刻蚀进行元素的深度分布剖析，得到了表面氧化层厚度，所得结果与Rutherford背散射（RBS）方法测量的结果相吻合。实验表明，样品暴露在空气中20至30min，氧化即基本达到饱和，相应的氧化层厚度约为20nm，氧化层的组分以NdO为主。Abstract: The process of the surface oxidizing of Nd thin films used in X-ray laser experiment is studied through AES method combined with Ar ion beam etching. The experimental results, which agree well with that of RBS, show that the surface oxidisation of Nd is saturated just 20~30 minutes after the sample exposed in air, the max thickness of oxide layer is about 20nm, and the main composition of oxide layer is NdO.
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Key words:
- nd thin film /
- oxidisation /
- x-ray laser /
- aes
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