YbF3沉积速率对红外激光薄膜表面缺陷的影响
Influence of YbF3 deposition rate on surface defect density of infrared laser thin film
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摘要: 在介绍了薄膜缺陷的特点及成因的基础上，分析了YbF3沉积速率对红外激光薄膜表面缺陷密度的影响，得出了镀制激光薄膜所需的合适速率。结果表明：薄膜表面缺陷主要以节瘤缺陷与陷穴缺陷为主，其缺陷密度随YbF3沉积速率的减小基本表现为减小的趋势，当ZnS沉积速率约为0.2 nm/s，YbF3沉积速率约为0.4 nm/s时，可得到比较满意的激光薄膜，薄膜表面缺陷密度仅为0.000 675。Abstract: The properties and derivation of defects in thin film are introduced in this paper. The influence of the deposition rate of YbF3 on the surface defect density of infrared laser thin film is analyzed. The appropriate deposition rate of YbF3 on the thin film is put forward. The result shows that the nodules and concave holes are the main defects in the infrared laser thin film, and that the defect density decreases with the decrease of deposition rate of YbF3. The defect density is only 0.000 675 when deposition rates are 0.4 nm/s for ZnS and 0.2 nm/s for YbF3, respectively.
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Key words:
- laser thin film /
- deposition rate /
- defect density /
- laser damage threshold
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