合肥光源镀膜陶瓷真空室纵向阻抗计算
Longitudinal impedance calculation of coated ceramic vacuum chamber at HLS
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摘要: 在估计合肥光源新注入系统中回形镀膜陶瓷真空室的耦合阻抗时,对于规则轴对称边界,可以采用场匹配技术求解柱坐标系中Maxwell方程得到耦合阻抗解析表达式。对于非规则形状,解析求解困难,须根据同轴线方法测量纵向阻抗基本原理,数值计算镀膜陶瓷真空室耦合阻抗。计算结果表明,陶瓷真空室内表面镀金属膜可以大大降低束流耦合阻抗,但镀膜陶瓷真空室仍是合肥光源储存环的主要阻抗来源之一。Abstract: The purpose of this paper is to estimate the longitudinal coupling impedance of the coated ceramic vacuum chamber employed in new injection system of Hefei Light Source. For the regular axially symmetric boundary, the analytical results of the impedance for the coated ceramic chamber can be easily obtained by application field matching techniques to Maxwell equations in cylindrical coordinate system. For the irregular boundary used in HLS, it is very hard to obtain analytical result of impedance. Based on the impedance measurement principle of coaxial wire method, the impedance of ceramic chamber was numerically calculated. The calculated results showed that, although coating inside ceramic chamber can reduce impedance by some factor, the coated ceramic chamber is one of the main impedance
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