均匀软X射线多层膜制备方法研究
Study of uniform soft X-ray multilayers deposition technology
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摘要: 介绍了基于速度调制技术的均匀软X射线多层膜制备方法，并采用该方法在直径为150mm的平面硅基板上制备出Mo/Si多层膜，其中心波长为13.5nm，膜厚空间非均匀性优于1％，较转盘匀速溅射方法制备的多层膜膜厚空间均匀性提高了近6倍。Abstract: A uniform soft X-ray multiplayers deposition technology is introduced in this paper, in which the platter revolution speed is varied as a function of its position relative to the sputtering source. Using this method, the relative thickness variation of the Mo/Si multilayers with central wavelength of 13.5nm was reduced from 7% to 1% peak to valley over 150mm diameter region on flat Si substrates.
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Key words:
- soft x-ray /
- multilayer coatings /
- magnetron sputter /
- uniformity
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