电子束、离子辅助和离子束溅射三种工艺对光学薄膜性能的影响
Property comparison of optical thin films prepared by Ebeam,ion assisted deposition and ion beam sputtering
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摘要: 运用电子束、离子辅助和离子束溅射三种镀膜工艺分别制备光学薄膜，包括单层氧化物薄膜和增透膜，然后采取一系列测试手段，如Zygo轮廓仪、原子力显微镜、表面热透镜技术和X射线衍射等技术，来分析和研究不同的工艺对这些薄膜性能的不同影响，以判断合理的沉积工艺。Abstract: 电子束; 离子辅助; 离子束溅射; 薄膜特性 The optical thin films, including single thin films of ZrO2, TiO2, Al2O3 and AR coatings, were respectively prepared by Ebeam, ion assisted deposition and ion beam sputtering. Then these thin films' properties were measured by several methods, such as profilemeter, atomic force microscopy, surface thermal lensing and Xray diffraction. The thin films' refractive index, surface roughness, absorption and microstructure were given and discussed. Finally, the conclusion was drawn: the option of proper technique to fabricate optical thin films is ion assisted deposition.
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Key words:
- ebeam /
- ion assisted deposition /
- ion beam sputtering /
- thin film properties
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