状态方程实验用铜多台阶靶制备工艺
Fabrication of Cu multi-step target used in EOS experiment
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摘要: 采用单点金刚石切削技术，通过合理的刀具设计、夹具设计及工艺过程设计，确定了加工工艺参数，完成了厚度几μm至几十μm的无氧铜多台阶靶的制备。通过触针式轮廓仪,台阶仪,白光干涉仪对表面轮廓及粗糙度进行了测量。结果表明：通过单点金刚石切削技术加工成形的铜多台阶靶，各台阶表面均方根粗糙度小于50 nm，工件表面轮廓平直，台阶垂直度较好。采用阿基米德原理对材料密度进行测量，加工成形后密度为(8.945±0.074) g/cm3,接近材料理论密度。Abstract: The copper multi-step target with several to several tens of microns in thickness used in equation of state(EOS) experiment was produced by single point diamond turning(SPDT) technology. Parameters of finish process are given by rational tool design, clamp design and technical process design. The surface roughness is characterized by profile testing instrument, profilometer and white light interferometer. The results indicate that surface root mean square roughness of copper multi-step target by SPDT is less than 50 nm. The density of target material is tested by Archimedes principle. The result showed that the density of the copper mutil-step target is （8.945±0.074） g/cm3.
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Key words:
- single point diamond turning /
- multi-step /
- copper /
- target
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