化学膜激光损伤行为
Laser-induced damage of sol-gel coating
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摘要: 研究了化学膜/熔石英基片体系（膜层镀于熔石英基片上）的激光损伤。化学膜为纯洁的溶胶凝胶二氧化硅增透膜，测量阈值的激光器输出波长为355 nm，脉宽为6.3 ns。结果表明体系的激光损伤阈值与基片的阈值相当且随其提高而提高。当基片的阈值为4.8 J·cm-2时，镀膜后阈值为4.9 J·cm-2；用激光预处理提高基片的阈值到7.2 J·cm-2，镀膜后阈值提高到7.3 J·cm-2。采用动态比较法研究表明：激光作用于化学膜/熔石英基片体系，基片先损伤，后引起膜层损伤。Abstract: Laser-induced damage of optical thin film/silica system was studied. The thin film was sol-gel derived silica antireflective coating, which was plated on silica substrate, and the laser with 355 nm wavelength and 6.3 ns pulse width was used in measurement. The results show that the laser induced damage threshold of the system equals to that of the silica substrate and increases with the latter’s increase. The threshold of the system is 4.9 J/cm2 when the threshold of the substrate is 4.8 J/cm2. When the threshold of the substrate is increased to 7.2 J/cm2 by laser pretreatment, the system threshold increases to 7.3 J/cm2. According to dynamic comparison, the substrate is the fragile part in the film/silica system, which is damaged first under la
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Key words:
- antireflective coating /
- laser induced damage /
- silica /
- sol-gel
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