基于平板模型的X射线散射特性研究
Scatter law of flat model
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摘要: 为了进一步研究高能X光散射的特性,以平板为模型,通过解析方法和蒙特卡罗(MC)数值模拟研究了X光散射的规律。研究结果表明:高能X光的散射以康普顿散射为主,当平板厚度相应的X光光程小于2.0时,平板散射中的一次康普顿散射超过75%;当到达探测器的散射照射量最大时,平板厚度相应的X光光程介于1.0与2.0之间。Abstract: A flat model is used to further study the scatter law in the X-ray radiography. The results are obtained with the analytic method and the MC simulations. One shows that in the radiography the Compton scatter is the dominant mode of interactions between the photon and the material and the first Compton scatter is more than 75 percent of the total scatter when the optical path of the flat is less than 2.0. And the analytic model is established effectively with the first Compton scatter approximation to the total. Another is that the same conclusion, which is the optical path of the flat is between 1.0 and 2.0 when the maximum scatter happens, is gained by analytic method, MC method with first Compton scatter and MC method with total scatter, respectively.
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Key words:
- radiography /
- scatter /
- optical path /
- flat
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