X射线Kirkpatrick-Baez显微镜用超反射镜的研制
Development of X-ray supermirrors used in Kirkpatrick-Baez microscope
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摘要: 介绍了一种可应用于X射线Kirkpatrick-Baez（KB）显微镜的光学元件—X射线超反射镜。选用的W和B4C作为镀膜材料，膜对数为20，采用单纯型调优的方法实现了X射线超反射镜设计，用磁控溅射的方法在Si基片上完成了W/B4C X射线超反射镜的制备。采用高分辨率X射线衍射仪（8 keV）测量了X射线超反射镜的反射特性。制备的X射线超反射镜在掠入射角分别为1.052°和1.143°处，反射角度带宽为0.3°，反射率达到20%，可满足KB型显微镜的要求。Abstract: Design and fabrication of the X-ray supermirror used as reflective optical element in Kirkpatrick-Baez (KB) microscope were proposed. W/B4C was selected as coating materials pair. Design method and optimization of X-ray supermirrors were discussed. The designed multilayer structure was deposited on the Si wafer substrate using magnetron-sputtering system. The reflectivities of W/B4C supermirrors were measured by X-ray diffraction instrument (8 keV). The reflectivities of supermirrors are 20% at 1.052° and 1.143° designed grazing incident angles. The bandwidth of reflective plateau reaches 0.3°, which can fulfill the requirements of KB microscope.
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Key words:
- multilayer /
- x-ray supermirror /
- kb microscope /
- magnetron-sputtering /
- reflectivity
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