脉冲激光辐照TiO2/SiO2薄膜热效应研究
Thermal effect of TiO2/SiO2 film irradiated by pulse laser
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摘要: 采用1.06 μm单脉冲激光在不同能量密度下辐照特殊光电系统中典型薄膜光学元件，理论分析了激光辐照薄膜元件产生的温度场和热应力场，在此基础上建立了激光辐照多层薄膜的物理模型，计算软件使用ANSYS软件的热分析模块对激光辐照薄膜元件产生的温度场和热应力场进行了模拟，分别给出不同激光能量密度下薄膜表面光斑中心的温度场、径向温度场和轴向温度场分布；同时给出不同能量密度下薄膜的轴向、径向和环向热应力分布。并对激光辐照薄膜元件产生的温度场、热应力场进行了分析，阐明了原因。Abstract: Using 1.06 μm single pulse laser to irradiate optical element model of photoelectricity system in different energy density, physical model of multilayer films is found and temperature field of facula center, radial direction and axes direction is calculated with ANSYS software. At the same time thermal stresses in radial direction, axes direction and round direction in different energy density are calculated. Change of temperature field and thermal stress are analysed.
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Key words:
- laser irradiating /
- film /
- temperature field /
- thermal stress
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