化学法制备的HfO2薄膜的激光损伤阈值研究
Laser-induced damage threshold of hafnia thin films with chemical method
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摘要: 采用化学法制备了HfO2介质膜，研究了热处理、紫外辐照以及Al2O3复合对HfO2介质膜激光损伤阈值的影响。采用红外光谱（FTIR）和X射线衍射仪对薄膜进行了表征，并用输出波长为1.064 μm、脉宽为10 ns的电光调Q激光系统测试薄膜的激光损伤阈值。实验结果表明：采用150 ℃左右的温度对薄膜进行热处理可以提高薄膜的激光损伤阈值，所获得的薄膜的激光损伤阈值高达42.32 J/cm2，比热处理前的激光损伤阈值提高了82%；无机材料Al2O3的适量添加能够提高薄膜的激光损伤阈值，其中HfO2与Al2O3的最佳质量配比约为95∶5；另外，对薄膜进行适当的紫外辐照也可改善HfO2 薄膜以及HfO2-Al2O3复合薄膜的抗激光损伤性能。紫外辐照对提高HfO2-Al2O3复合薄膜的激光损伤阈值效果尤为显著，辐照40 min后的激光损伤阈值达到44.33 J/cm2，比紫外辐照前的激光损伤阈值提高了90%。
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关键词:
- HfO2薄膜 /
- 热处理 /
- 紫外辐照 /
- HfO2-Al2O3复合薄膜 /
- 激光损伤阈值
Abstract: HfO2 thin films were prepared with chemical method. The influences of heat treatment, UV irradiation and addition of inorganic Al2O3 on laser-induced damage thresholds (LIDT) of HfO2 thin films were studied. HfO2 thin films were characterized by FTIR and X-ray diffraction. And 1-on-1 laser-induced damage threshold tests on HfO2 thin films and HfO2-Al2O3 composite films were carried out with a Q-switched Nd:YAG high power laser at 1 064 nm with a pulse width of 10 ns. The research results showed that the LIDT of the HfO2 thin films could be improved by heating the thin films at 150 ℃.The LIDT of the thin films heated at 150 ℃ was 42.32 J/cm2, which was 82% higher than that of the as-prepared samples. The addition of inorganic Al2O3 to the HfO2 thin films could also enhance the LIDT of thi -
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