SiO2内保护层对LiB3O5晶体倍频增透膜损伤阈值的影响
Effect of SiO2 barrier layer on laser induced damage threshold of second harmonic antireflection coatings on LiB3O5 crystal
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摘要: 利用离子辅助电子束沉积方法在LiB3O5基底上镀制了不加SiO2内保护层和加SiO2内保护层的倍频增透膜，测量了两类薄膜在波长1 064 nm多脉冲辐照下的激光损伤阈值，获得了两种不同的损伤形貌，并对损伤原因作了初步探讨。实验结果表明：保护层的加入把由基底膜层界面缺陷吸收所决定的阈值改变到由HfO2膜层内缺陷吸收所决定的阈值，显著提高了倍频增透膜的抗激光损伤能力。Abstract: Two different kinds of second harmonic antireflection(AR) coatings, with and without SiO2 barrier layer were prepared with ion assisted deposition on LiB3O5 crystal. Laser induced damage threshold(LIDT) by multiple-shot irradiation at 1 064 nm was studied and two typical damage morphologies were observed by SEM. The AR coatings with SiO2 barrier layer have an excellent LIDT, which is about 40% higher than that of coatings without barrier layer. The mechanism of LIDT enhancement by adding SiO2 barrier layer is also discussed.
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