沉积温度对热舟蒸发MgF<sub>2</sub>薄膜性能的影响

尚淑珍; 赵祖欣; 邵建达

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沉积温度对热舟蒸发MgF₂薄膜性能的影响

1.
华东理工大学机械与动力工程学院承压系统安全科学教育部重点实验室,上海 200237;
2.
中国科学院上海光学精密机械研究所,上海 201 800

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出版历程
- 刊出日期: 2008-03-15

Effects of deposition temperature on resistant-boat evaporated MgF2 films

1.
Key Laboratory of Safety Science of Pressurized System,Ministry of Education,School of Mechanical Engineering,East China University of Science and Technology,Shanghai 200237,China;
2.
Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,P.O.Box 820-211,Shanghai 201800,China

摘要

摘要: 采用热舟蒸发方法沉积了氟化镁(MgF2)材料的单层膜，沉积温度从200 ℃上升到350 ℃，间隔为50 ℃。测量了样品的透射率和反射率光谱曲线，进行了表面粗糙度的标定，并在此基础上进行了光学损耗及散射损耗的计算。同时对355 nm波长处的激光诱导损伤阈值进行了测量。结果表明:随着沉积温度的升高，光学损耗增加;在短波长范围散射损耗在光学损耗中所占比例很小，光学损耗的增加主要由吸收损耗引起；在355 nm波长处的损伤阈值变化与吸收损耗的变化趋势相关，损伤机制主要是吸收起主导作用。样品的微缺陷密度也是影响损伤阈值的一个重要因素，损伤阈值随缺陷密度的增加而降低。
- 光学薄膜 /
- 氟化镁 /
- 光学损耗 /
- 吸收 /
- 损伤阈值
Abstract: Single layers of MgF2 were deposited upon super polished fused-silica substrates by resistance boat evaporation at different temperatures from 200 ℃ to 350 ℃ by increasing step of 50 ℃. The transmittance and reflectance spectra were measured and the root-mean-square surface roughness was determined. The total optical loss and scattering loss were calculated. The laser-induced damage threshold(LIDT) was characterized at the wavelength of 355 nm for certain samples. It was found that the total optical loss and the root-mean-square surface roughness increased with the increasing of the deposition temperature. At the short wavelength period the increasing total optical loss at certain deposition temperature was mainly caused by absorption while scattering loss occupied a very low percentage
- optical film /
- mgf2 /
- optical loss /
- absorbance /
- laser-induced damage threshold