高重复频率飞秒激光对面阵CCD的干扰和破坏
Failure of array CCD irradiated by high-repetitive femto-second laser
-
摘要: 采用800 nm,100 fs的超短脉冲激光器对硅面阵CCD进行辐照实验,观测到饱和、串扰以及永久性损伤等多种可能造成成像器件失效的现象,特别是在激光能量较高时,发现CCD在成像时出现了黑白屏的现象。在飞秒激光器以1,10和1 000 Hz工作的条件下,分别测量了硅面阵CCD的饱和阈值、串扰阈值和破坏阈值。对破坏后的CCD器件进行了显微分析。在1 kHz工作的条件下进行了视场外干扰实验,观察到串扰和全屏饱和的现象。Abstract: Silicon-CCD is irradiated by 800 nm 100 fs pulsed laser, and the phenomena of saturation, cross-talk and totally damage are observed and corresponding thresholds versus repetitive frequency are measured. Particularly, a new damage phenomenon characterized by a degraded image divided into a bright part and a dark part is observed. Microscope is used to analyze the damage mechanism and it is inferred that the most severe failure could result from the malfunction of CCD circuits because of laser irradiation. Typical results of CCD irradiated by laser out of field of view is also presented.
-
Key words:
- femto-second laser /
- array ccd /
- damage mechanism /
- cross-talk /
- saturation
点击查看大图
计量
- 文章访问数: 2432
- HTML全文浏览量: 386
- PDF下载量: 602
- 被引次数: 0