离子束辅助反应制备的氧化铪薄膜特性
Characteristics of hafnium oxide deposited by reactive ion-assisted deposition
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摘要: 采用电子束直接蒸发氧化铪、无辅助电子束反应蒸发和离子束辅助反应蒸发金属铪3种沉积方式制备了单层HfO2薄膜，对样品的光学性能、结构特性以及激光损伤特性进行了研究。实验结果表明：通过反应沉积的方法可以有效减少缺陷产生并改善均匀性，施加离子辅助可以提高薄膜的折射率，在一定条件下还可以有效地降低吸收，但激光损伤阈值仍未达到直接采用氧化铪制备的水平；晶体结构方面，离子辅助条件下可以获得单斜相氧化铪薄膜，并且随着轰击能量的提高由(002)面的择优取向向(-111)面转变。Abstract: HfO2 films have been deposited by electron beam evaporation of hafnium oxide, reactive evaporation without ion beam assistance and reactive ion beam assisted deposition(RIBAD). Optical and structural properties and laser-induced damage threshold(LIDT) of the films have been studied. It is found that HfO2 film deposited with reactive deposition has less defects and good uniformity. The sample deposited by RIBAD has higher refraction index, and can reduce absorption at a certain condition, but it LIDT is under improvement. The crystal structure of the sample deposited with RIBAD is monoclinic, and when the bombardment energy rises, the preferred orientation changes from (002) to (-111).
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Key words:
- thin film /
- hafnium oxide /
- ion-assisted deposition /
- reactive deposition
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