高抗激光损伤阈值介孔SiO2 减反射膜
Anti-reflective mesoporous SiO2 films with high laser-induced damage threshold
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摘要: 用P123作模板剂,通过正硅酸乙酯的水解缩聚和溶剂蒸发自组装过程在K9玻璃上制备介孔SiO2膜。应用FT-IR,XRD,N2 吸附-脱附,AFM和UV-Vis表征手段研究了薄膜的介孔结构和光学性能，并使用“R-on-1”模式，以Nd:YAG脉冲激光（9.2 ns, 1 064 nm）测试了薄膜的激光损伤阈值。结果表明:所镀制单层介孔SiO2膜具有规整的2D p6 mm长周期结构，为SBA-15型，膜层表面比较平整（均方根粗糙度为2.923 nm），在1 064 nm处的透过率为99.5%, 换算为激光脉宽为1 ns时，膜层的激光损伤阈值为21.6 J/cm2，显示出了较好的减反性能和抗激光损伤性能。Abstract: Mesoporous SiO2 film with 2D p6 mm structure was successfully coated on K9 glasses via the hydrolysis-condensation process and the so-called evaporation induced self-assembly process using P123 as a surfactant. The structure and optical properties of the film were characterized with FT-IR,XRD,N2 adsorption-desorption,AFM and UV-Vis. The laser-induced damage threshold of the film was tested with “R-on-1” model on Nd:YAG laser(9.2 ns, 1 064 nm). The as-prepared single-layer mesoporous SiO2 film was proved to have ordered 2D p6 mm structure, SBA-15 type and average roughness of 2.923 nm. The film showed high trassimittance of 99.6% at the wavelength of 1 064 nm. The laser-induced damage threshold was 21.6 J/cm2 when the laser pulse was 1 ns, at wavelength of 1 064 nm.
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