磁性ICF玻璃靶丸的化学镀工艺
Process of electroless plating on magnetic ICF glass targets
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摘要: 采用化学镀工艺在ICF玻璃靶丸表面包覆了一层磁性的Ni-P合金镀层，制备出磁性ICF玻璃靶丸。研究了化学镀主盐质量浓度、还原剂质量浓度、络合剂质量浓度、施镀温度及镀液pH值对沉积速率与镀液稳定性的影响，获得了化学镀制备磁性ICF玻璃靶丸的最佳工艺为：主盐硫酸镍30 g/L，还原剂次亚磷酸钠30 g/L，络合剂柠檬酸钠50 g/L，pH值10，温度(40±2) ℃。Abstract: Magnetic ICF glass targets were prepared by electroless plating technology in which magnetic Ni-P coatings covered the surfaces of ICF glass targets. The effects of mass density of main salt, mass density of reducer, mass density of complexant, temperature and pH value of electrolyte on deposition rate of Ni-P plating and bath stability were studied. Then an optimum process of electroless plating on ICF glass targets, in which mass density of main salt NiSO4 is 30 g/L, mass density of reducer NaH2PO2 is 30 g/L, mass density of complexant Na3C6H5O7 is 50 g/L, temperature is (40±2) ℃ and pH value is 10, has been obtained.
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Key words:
- icf glass target /
- magnetic /
- electroless plating /
- process
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