磁控溅射制备横向梯度分布的Mo/Si周期多层膜
Fabrication of laterally graded periodic Mo/Si multilayer using magnetron sputtering technology
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摘要: 采用磁控溅射方法在Si基板上镀制了横向梯度分布的Mo/Si周期多层膜。以X射线掠入射反射测量了横向梯度多层膜的膜系结构，在基板65 mm长度范围内，多层膜周期从8.21 nm线性减小到6.57 nm，周期梯度为0.03 nm/mm。国家同步辐射实验室反射率计的反射率测试结果表明：该横向梯度分布周期多层膜上不同位置，能反射在13.3~15.9 nm波段范围内不同波长的极紫外光，反射率为60%~65%。Abstract: A laterally graded multilayer was deposited on silicon substrate by using magnetron sputtering. The d-spacing gradient of 0.03 nm/mm was achieved across a 65 mm long range on the substrate’s surface, with d-spacing varying linearly from 8.41 nm to 6.57 nm, which was measured by grazing incidence X-ray reflection (GIXR). Extreme ultraviolet reflectivity was measured in National Synchrotron Radiation Laboratory(NSRL). The measured reflectivity is 60%~65% at the wavelength range of 13.3 to 15.9 nm.
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