离子注入掺杂锐钛矿TiO2薄膜的光学性能
Optical properties of N-doped anatase TiO2 films prepared by ion implantation
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摘要: 在玻璃基体上，采用射频磁控溅射方法在不同的基体温度下制备了TiO2薄膜，然后在薄膜中注入注量分别为5×1016, 1×1017和5×1017/cm2的N离子以制备N掺杂的TiO2薄膜。X射线衍射结果表明：制备出的TiO2薄膜为锐钛矿型。X射线光电子能谱研究结果表明：注入的N离子与TiO2晶粒相互作用，形成了含氮的TiOxN2-x化合物，从而改变了TiO2薄膜的吸收边；随N离子注量增加，吸收边移动更明显；同时，由于氮离子注入产生的辐照缺陷使TiO2薄膜在紫外和可见光区的吸收也明显增强。Abstract: Optical properties of N-doped anatase TiO2 films prepared by N ion implantation have been studied. At first, TiO2 films were prepared by RF magnetron sputtering at different substrate temperatures. Then N ion implantations in the films were conducted at fluences of 5×1016, 1×1017 and 5×1017/cm2, respectively. X-ray diffraction(XRD) results show TiO2 is anatase. X-ray photoelectron spectroscopy(XPS) results reveal that N ions interact with TiO2 particles and form TiOxN2-x compound, which leads to the shift of the absorption edge. Simultaneously, the irradiation defects caused by N ion implantation also increase the absorption intensity of TiO2 films in the range of UV-Visible light．
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Key words:
- tio2 film /
- anatase /
- n doping /
- ion implantation /
- absorption spectrum /
- rf magnetron sputtering
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