利用密度反馈实现离子源长脉冲放电
Long pulse ion source discharge based on plasma density feedback
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摘要: 介绍了等离子体密度对离子源放电的影响，为了获得长脉冲放电，采用朗缪尔探针测量等离子体密度并反馈调节离子源放电。基于朗缪尔探针测量，设计了控制部分硬件与软件构架，建立了离子源等离子体密度反馈控制系统，并成功地应用于离子源等离子体放电实验，通过反馈调节实验进气，得到了长达4.5 s的长脉冲放电，为中性束注入稳态运行提供了依据。Abstract: The influence of plasma density on plasma discharge has been introduced. In order to obtain the long pulse discharge, the Langmuir probe was employed to measure the plasma density and to control the plasma discharge with feedback. The hardware and software of the control parts were designed and the plasma density feedback control system was established based on the Langmuir probe measurement. Besides, the system was applied to the ion source plasma discharge experiment successfully. The long pulse discharge of 4.5 s was got and it provides the fundamental for the steadystate operation of neutral beam injection in the future．
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Key words:
- ion source /
- langmuir probe /
- density feedback control /
- long pulse discharge
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