电子束蒸发沉积六硼化镧薄膜的逸出功
Work function of e-beam deposited Lanthanum hexaboride film
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摘要: 六硼化镧(LaB6)具有电子逸出功低、高熔点和高化学稳定性等优点，是制作热阴极和场发射阴极的理想发射体材料。而且在常规场发射尖锥表面涂敷一层LaB6)薄膜能够大幅度提高场发射尖锥的发射能力。为了测量LaB6) 薄膜的逸出功，采用电子束蒸发技术沉积LaB6)薄膜，并对薄膜进行了X射线衍射分析和X射线光电谱分析。通过测量薄膜的热电子发射特性和敷LaB6)薄膜的硅尖锥阵列的场致电子发射特性确定了LaB6薄膜的逸出功，与块状LaB6)多晶材料的逸出功大体相同，说明电子束蒸发沉积技术适合于制备高纯度、低逸出功的LaB6薄膜。Abstract: Lanthanum hexaboride (LaB6) is a low work function material. When coated on conventional field emission tips, it can significantly enlarge the field emission current of the tips. To determine its work function, LaB6 films were deposited through e-beam deposition. It is found that the films with low oxygen content were (100) preferentially oriented. The work function was measured by thermal emission and field emission independently, yielding a value of 2.67 eV and 2.91 eV, respectively, suggesting that e-beam deposited LaB6 films preserve the low work function of bulk LaB6.
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Key words:
- lanthanum hexaboride /
- work function /
- e-beam deposition /
- thermal emission /
- field emission
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