衬底温度对HfO2薄膜结构和光学性能的影响
Influence of substrate temperature on structural and optical properties of HfO2 thin films
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摘要: 采用直流磁控反应溅射法，分别在室温，200，300，400和500 ℃下制备了HfO2薄膜。利用X射线衍射（XRD）、椭圆偏振光谱（SE）和紫外可见光谱（UV-vis）研究了衬底温度对HfO2薄膜的晶体结构和光学性能的影响。XRD研究结果显示：不同衬底温度下制备的HfO2薄膜均为单斜多晶结构；随衬底温度的升高，（-111）面择优生长更加明显，薄膜中晶粒尺寸增大。SE和UV-vis研究结果表明：随衬底温度升高，薄膜折射率增加，光学带隙变小；制备的HfO2薄膜在250～850 nm范围内有良好的透过性能，透过率在80%以上。Abstract: HfO2 films were deposited by direct current reactive magnetron sputtering on n-type Si(100) substrates and fused silica substrates, respectively. The substrate temperature ranges from room temperature to 500 ℃. The influence of substrate temperature on structure and optical properties of the films was investigated by X-ray diffraction(XRD), spectroscopic ellipsometry(SE) and ultraviolet visible spectroscopy(UV-vis). XRD results show that all deposited films are polycrystalline with monoclinic structure. As the substrate temperature increases, the preferred orientation of (-111) becomes more obvious, and the grain size of HfO2 films increases. SE and UV-vis results demonstrate that, with the substrate temperature increasing, the refractive index increases and the optical band ga
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