表面Al膜污染物诱导熔石英表面损伤特性
Laser induced damage in fused silica contaminated by Al film
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摘要: 在熔石英表面人工溅射一层Al膜污染物，分别测试污染前后熔石英基片在355 nm波长激光辐照下的损伤阈值，并采用透射式光热透镜技术、椭偏仪和光学显微镜研究了污染物Al膜的热吸收、厚度以及激光辐照前后熔石英的损伤形貌。用355 nm波长的脉冲激光分别辐照位于污染的熔石英和洁净的熔石英前后表面的损伤点，并用显微镜在线采集损伤增长图样，测试损伤点面积。实验表明：熔石英前表面的金属Al膜污染物导致基片损伤阈值的下降约30%，后表面的污染物导致基片下降约15%，位于熔石英样片后表面损伤点面积随激光辐照次数呈指数增长，而位于前表面的损伤点面积与激光脉冲辐照次数呈线性增长关系；带有污染的熔石英样片的增长因子比洁净的熔石英样片的增长因子高30%。Abstract: Fused silica substrates were artificially contaminated to estimate the resistance against laser damage. Uniform thin contamination films (about 8 nm thick) were deposited on the substrates by Al sputtering. The laser induced damage threshold (LIDT) was tested at 355 nm with a 6.8 ns Nd:YAG laser in the air. Thermal absorption, thickness of the films and surface morphologies of fused silica before and after contamination were investigated by Stanford photo-thermal solutions, ellipsometer and optical microscope, respectively. The damage sites located on the clear fused silica, and on the input and output surface of the contaminated fused silica have been irradiated respectively with 355 nm pulsed laser. Photographs of the growth of the damaged sites have been taken by the microscope on line,
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Key words:
- fused silica /
- laser damage /
- contamination /
- damage growth /
- damage morphology
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