磁控溅射方法制备直径120 mm高均匀性Mo/Si多层膜
Fabrication of high uniformity Mo/Si multilayer with 120 mm diameter using magnetron sputtering
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摘要: 为满足极紫外、软X射线和X射线大口径多层膜反射镜的需求，采用基板扫掠过矩形靶材表面的镀膜方法，在直径120 mm的平面基板上镀制了Mo/Si周期多层膜。通过调整基板扫掠过矩形靶材表面的速率修正了薄膜的沉积速率，极大地提高了薄膜厚度的均匀性。采用X射线衍射仪对反射镜不同位置多层膜周期厚度进行了测量，结果表明，在直径120 mm范围内，Mo/Si多层膜周期厚度的均匀性达到了0.26%。同步辐射测量多层膜样品不同位置处的反射率，结果表明，在直径120 mm范围内，多层膜的膜层厚度均匀，在入射角10°时13.75 nm波长处平均反射率为 66.82%。Abstract: In order to prepare large size multilayer mirrors for extreme ultraviolet, soft X-ray and X-ray applications, the Mo/Si multilayer was deposited on flat substrate in diameter of 120 mm with the substrate scanning over rectangular targets. By adjusting the speed of substrate scanning over sputtering targets, the depositing rate can be controlled, and the uniformity of layer thickness is improved significantly. After deposition, period thicknesses of multilayer on different positions of the mirror were measured by an X-ray diffractometer. The measured results show that, within the diameter of 120 mm, the uniformity of period thickness is within 0.26%. The reflectivities on different positions of the multilayer mirror were measured at the National Synchrotron Radiation Laboratory. The results
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Key words:
- mo/si multilayer /
- magnetron sputtering /
- uniformity /
- reflectivity /
- synchrotron radiation
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