飞秒激光制备硅窗口增透保护类金刚石膜
Preparation of anti-reflective and protective diamond-like carbon film on Si substrate by femto-second pulsed laser deposition
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摘要: 采用飞秒激光（800 nm, 120 fs, 3 W, 1 000 Hz）制备类金刚石膜，研究了不同偏压、生长温度和氧气氛等辅助手段对激光沉积类金刚石膜的影响，实验发现在室温（25 ℃）、无偏压和低气压氧气氛（2 Pa）条件下沉积的类金刚石膜性能最优。在单面预镀普通增透膜的硅红外窗口材料上镀制出了无氢类金刚石膜，3~5 μm 波段平均透过率达到90%以上，纳米硬度高达40 GPa，用压力为9.8 N的橡皮磨头，摩擦10５次，膜层未见磨损，并且通过了军标规定的高温、低温、湿热、盐雾等环境试验，所制类金刚石膜可对红外窗口起到较好的增透保护作用。Abstract: A femtosecond pulsed laser(800 nm, 120 fs, 3 W, 1 000 Hz) was used to deposit diamond-like carbon(DLC) films on Si substrate. Effects of bias, substrate temperature and oxygen ambient on DLC films were studied. Experiments show that the best DLC film was deposited under the conditions of room temperature, no bias and low oxygen pressure(2 Pa). The hydrogenfree DLC film was deposited on one side of Si substrate, and on the other side, the common anti-reflective film was pre-deposited. The average transmittance at 3~5 μm waveband was larger than 90%, and the nano-hardness was up to 40 GPa. There were no nicks on the film after being rubbed for 105 times by a 9.8 N rubber. Furthermore, the films have passed the high temperature, low temperature and salt-fog tests in military standards. T
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Key words:
- diamond-like carbon film /
- femtosecond pulsed laser /
- oxygen ambient /
- bias /
- temperature
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