基于时间控厚离子束溅射技术的宽带减反膜制备
Fabrication of broadband antireflection coating based on ion beam sputtering deposition technique with time-power monitoring
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摘要: 为了制备满足设计要求的宽角度、宽波段减反膜，利用离子束溅射沉积技术，在时间-功率控厚的模式下，对膜层沉积速率进行了精确修正。在实验中，利用时间-功率控厚的离子束溅射沉积技术，选择HfO2和SiO2作为高低折射率组合，在超抛ZF6玻璃基底上制备了宽角度、宽带减反膜，通过对实验后的透过率光谱曲线的数值反演计算，获得膜层厚度修正系数，初步得到了沉积速率随沉积时间变化的规律。利用修正后的沉积参数制备设计的膜系，在0°~30°入射角度下，600~1 200 nm波段的平均透过率达到99%以上。Abstract: With the development of optical systems for multi-wavelength and wide-angle range, there is a requirement of the antireflection coating with wide-spectrum and wide-incidence angle range. In this paper, the substrate is super-smooth ZF6 (rms less than 0.6 nm) glass and HfO2 and SiO2 are selected as high index and low index materials, respectively. The broadband antireflection coating is designed, for wavelength form 600 to 1 200 nm and incidence angle of 0° to 30°. The influences of refractive index inhomogeneity, error of refractive index and error of layer physical thickness on its transmittance are analyzed. Ion beam sputtering deposition of time-power thickness monitoring is used to manufacture the antireflection coating and the each layer thickness systematic co
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