高损伤阈值三倍频分离膜

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高损伤阈值三倍频分离膜

王孝东, 张锦龙, 马彬, 焦宏飞, 丁涛, 程鑫彬

文章导航 > 强激光与粒子束 > 2011 > 23(07): 0-

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王孝东, 张锦龙, 马彬, 等. 高损伤阈值三倍频分离膜[J]. 强激光与粒子束, 2011, 23(07).

引用本文:

王孝东, 张锦龙, 马彬, 等. 高损伤阈值三倍频分离膜[J]. 强激光与粒子束, 2011, 23(07).

wang xiaodong, zhang jinlong, ma bin, et al. Third harmonic separator with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 2011, 23.

Citation:

wang xiaodong, zhang jinlong, ma bin, et al. Third harmonic separator with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 2011, 23.

王孝东, 张锦龙, 马彬, 等. 高损伤阈值三倍频分离膜[J]. 强激光与粒子束, 2011, 23(07).

引用本文:

王孝东, 张锦龙, 马彬, 等. 高损伤阈值三倍频分离膜[J]. 强激光与粒子束, 2011, 23(07).

wang xiaodong, zhang jinlong, ma bin, et al. Third harmonic separator with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 2011, 23.

Citation:

wang xiaodong, zhang jinlong, ma bin, et al. Third harmonic separator with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 2011, 23.

高损伤阈值三倍频分离膜

王孝东^1,2,
张锦龙^1,2,
马彬^1,2,
焦宏飞^1,2,
丁涛^1,2,
程鑫彬^1,2

1.
同济大学精密光学工程技术研究所, 上海 200092;
2.
上海市特殊人工微结构材料与技术重点实验室, 上海 200092;
3.
同济大学航空航天与力学学院, 上海 200092

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出版历程
- 刊出日期: 2011-07-21

Third harmonic separator with high laser-induced damage threshold

1.
Institute of Precision Optical Engineering,Tongji University,Shanghai 200092,China;
2.
Shanghai Key Laboratory of Special Artificial Microstructure Materials and Technology,Shanghai 200092,China;
3.
School of Aerospace Engineering and Applied Mechanics,Tongji University,Shanghai 200092,China

摘要: 设计了Nd：YAG激光用三倍频分离膜，膜层材料为SiO2和HfO2。经过优化，膜系在355 nm处的反射率在99%以上，在532 nm和1 064 nm处透射率也在99%以上。采用电子束蒸发技术，在熔融石英基底上制备了样品,经测量，制备的分离膜光学性能与设计值接近。分离膜在355 nm激光辐照下的损伤阈值为5.1 J/cm2，并用微分干涉显微镜表征了薄膜损伤形貌。
- 三倍频分离膜 /
- 电子束蒸发 /
- 激光损伤阈值 /
- 光学薄膜
Abstract: Using electron beam evaporation, a 355 nm separator was designed by depositiing SiO2 and HfO2 alternatively. The coating has a reflectivity of larger than 99% at 355 nm through optimization and a transmittance larger than 99% at 532 nm and 1 064 nm. It has good electric-field distribution. The spectra of the fabricated coating is close to the designed one. The laser-induced damage threshold of the coating is 5.1 J/cm2. Morphology of laser-induced damage of the coating was characterized by differential interference contrast microscope．
- third harmonic separator /
- electron beam evaporation /
- laser-induced damaged threshold /
- thin film

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PDF下载量: 635
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