193 nm氟化物增透膜的特性
193 nm fluoride antireflection coatings
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摘要: 为了研制低损耗、高性能的193 nm氟化物增透膜，研究了基底和不同氟化物材料组合对氟化物增透膜的影响。在熔石英基底上，将挡板法和预镀层技术相结合，采用热舟蒸发方式制备了不同氟化物材料组合增透膜，对增透膜的剩余反射率和光学损耗等光学特性，以及表面粗糙度和应力等特性进行了测量和比较。在分析比较和优化的基础上，设计制备的3层1/4波长规整膜系AlF3/LaF3增透膜在193 nm的剩余反射率低于0.14%，单面镀膜增透膜的透射率为93.85%，增透膜表面均方根粗糙度为0.979 nm,总的损耗约为6％。要得到高性能的193 nm增透膜，应选用超级抛光基底。Abstract: The effect of different substrates and different fluorides are studied to develop low loss, high-performance 193 nm fluoride antireflection coatings. Different fluoride antireflection coatings are deposited by a molybdenum boat evaporation process on JGS1 substrates, and the thickness of the coatings is controlled by a 1/3 baffle with pre-coating technology. Experimental results and analyses show that all of these coatings have a low residual reflectivity and small optical loss, and the optical loss at 193 nm is mainly determined by the high refractive index film. Based on these studies, an LaF3/AlF3 193 nm antireflection coating is designed and deposited. Its residual reflectivity is less than 0.14%, single-sided transmittance is 93.85%, total loss is about 6% and RMS surface roughness is
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Key words:
- fluoride films /
- 193 nm antireflection coatings /
- pre-coating /
- substrate /
- residual reflectivity
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