表面层对1 064 nm高反射镜损伤阈值影响
Influence of outmost layer on laser induced damage threshold of 1 064 nm highreflection mirrors
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摘要: 采用电子束蒸发的方法制备了３种具有不同表面层材料及结构的中心波长为1 064 nm的零度高反镜，３种膜系表面层分别为1/4波长光学厚度的HfO2，1/2波长光学厚度的SiO2，以及1/4波长光学厚度的SiO2。光谱测试表明：三者在1 064 nm处均有较高的反射率（高于99.8%），利用热透镜的方法测量得到３个膜系辐照激光正入射情况下，薄膜对光的吸收比例分别为3.0×10-6，5.0×10-6和6.5×10-6，其损伤阈值分别为32.5，45.2和28.4 J/cm2。并在膜层内部电场分布和膜层材料物理特性的基础上分析了３种不同表面层膜系吸收和损伤阈值差别的原因。Abstract: Electron beam evaporation method was applied to deposit three sets of 1 064 nm laser mirrors with different outmost layers: quarter-wavelength HfO2， half-wavelength SiO2 and quarterwavelength SiO2 layers, respectively. High reflectivity (more than 99.8%) has been achieved for all the stacks, and irradiated at normal incidence photothermal measurements of absorption are 3.0×10-6, 5.0×10-6 and 6.5×10－6, respectively. Corresponding laser induced damage thresholds (LIDTs) are 32.5 J/cm2, 45.2 J/cm2 and 28.4 J/cm2. The relations of electric field distribution, absorption, layer material characters and LIDT are also discussed．
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