在19.5 nm处高反在30.4 nm处抑制的双功能薄膜
Dual-functional multilayer for high-reflectivity at 19.5 nm and low-reflectivity at 30.4 nm
-
摘要: 研究了极紫外波段的双功能光学元件。采用周期膜叠加的思想，运用遗传方法优化设计了在19.5 nm处高反，在30.4 nm处抑制的双功能多层膜。采用磁控溅射技术制备了多层膜，利用X射线衍射仪测试了多层膜的结构，在国家同步辐射实验室测试了双功能多层膜的反射特性。结果表明：制备出的双功能膜性能与设计相符，在入射角13°，19.5 nm处的反射率达到33.3%，接近传统的19.5 nm周期高反膜的反射率，并且在30.4 nm附近将反射率由1.1%降到9.6×10-4。Abstract: A dual-functional extreme ultraviolet(EUV) multilayer (ML) mirror was designed for high-reflectivity at 19.5 nm ( Fe Ⅻ line ) and low-reflectivity at 30.4 nm ( He Ⅱ line ). The design based on genetic algorithm (GA) utilized a stack composed of two periodic multilayers: a bottom multilayer for high reflectivity at 19.5 nm, and a top multilayer for low-reflectivity at 30.4 nm. The multilayer mirror was prepared by direct current magnetron sputtering, and characterized by grazing-incident X-ray diffraction(XRD) and synchrotron radiation(SR). The experiment results show that the dual-functional multilayer achieves the reflectivity of 33.3% at 19.5 nm and 9.6×10-4 at 30.4 nm at incident angle of 13°.
-
点击查看大图
计量
- 文章访问数: 1991
- HTML全文浏览量: 269
- PDF下载量: 579
- 被引次数: 0
下载:
