离子束技术对氧化铪薄膜性能的影响
Effect of ion beam technique on properties of hafnium dioxide thin film
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摘要: 在基底清洗、薄膜沉积和薄膜后处理三个阶段均采用离子束技术，制备了氧化铪薄膜，并对薄膜的光学性能、表面特性和激光损伤阈值特性进行测试和研究。结果表明，利用离子束技术清洗基底可以增强表面吸附；离子束辅助沉积在合适离子束能量下可以得到高堆积密度、高损伤阈值的薄膜；离子束后处理氧化铪薄膜可以降低表面粗糙度，改善抗激光损伤阈值。说明在三个薄膜制备阶段同时采用合适的离子束参数可以制备出结构致密、阈值高、表面粗糙度好的氧化铪薄膜。Abstract: The hafnium dioxide thin films were prepared by using ion beam in substrate clean, deposition and posttreatment of films. The optical performance, surface characteristics and laser damage of the films were tested and analyzed. Experiment results show that the application of ion beam deposition in clean of substrates can wipe off polishing powder particle, enhance surface adsorption and increase stacking density. The application of ion beam deposition in deposition of thin films can improve thin films structure, decrease absorption of moisture, and increase damage threshold. The application of ion beam deposition in post-treatment can reduce surface roughness and improve damage threshold．
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